Study of photoresist plug etching back with CO/O2 plasma for dense-ISO via recess loading tunning
Liu, Xiaobing, Huang, Manson, Tsai, Michael, Wang, Zhaoxiang, Su, Xingcai
Published in 2019 China Semiconductor Technology International Conference (CSTIC) (01.03.2019)
Published in 2019 China Semiconductor Technology International Conference (CSTIC) (01.03.2019)
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