Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2, N2/H2, and NH3 plasma treatments
Huang, Li-Tien, Chang, Ming-Lun, Huang, Jhih-Jie, Kuo, Chin-Lung, Lin, Hsin-Chih, Liao, Ming-Han, Lee, Min-Hung, Chen, Miin-Jang
Published in Journal of physics. D, Applied physics (06.02.2013)
Published in Journal of physics. D, Applied physics (06.02.2013)
Get full text
Journal Article
Characteristics and performance of Cr2O3/CrN double-layered coatings deposited by cathodic arc plasma deposition
HSU, Cheng-Hsun, HUANG, Dung-Hau, HO, Wei-Yu, HUANG, Li-Tien, CHANG, Chi-Lung
Published in Materials science & engineering. A, Structural materials : properties, microstructure and processing (15.08.2006)
Published in Materials science & engineering. A, Structural materials : properties, microstructure and processing (15.08.2006)
Get full text
Journal Article
Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
Huang, Jhih-Jie, Huang, Li-Tien, Tsai, Meng-Chen, Lee, Min-Hung, Chen, Miin-Jang
Published in ECS journal of solid state science and technology (01.01.2013)
Published in ECS journal of solid state science and technology (01.01.2013)
Get full text
Journal Article
Enhancement of electrical characteristics and reliability in crystallized ZrO2 gate dielectrics treated with in-situ atomic layer doping of nitrogen
Huang, Jhih-Jie, Huang, Li-Tien, Tsai, Meng-Chen, Lee, Min-Hung, Chen, Miin-Jang
Published in Applied surface science (30.06.2014)
Published in Applied surface science (30.06.2014)
Get full text
Journal Article
Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
Huang, Li-Tien, Chang, Ming-Lun, Huang, Jhih-Jie, Lin, Hsin-Chih, Kuo, Chin-Lung, Lee, Min-Hung, Liu, Chee Wee, Chen, Miin-Jang
Published in Applied surface science (01.02.2013)
Published in Applied surface science (01.02.2013)
Get full text
Journal Article
Effect of hydrogen participation on the improvement in electrical characteristics of HfO 2 gate dielectrics by post-deposition remote N 2 , N 2 /H 2 , and NH 3 plasma treatments
Huang, Li-Tien, Chang, Ming-Lun, Huang, Jhih-Jie, Kuo, Chin-Lung, Lin, Hsin-Chih, Liao, Ming-Han, Lee, Min-Hung, Chen, Miin-Jang
Published in Journal of physics. D, Applied physics (06.02.2013)
Published in Journal of physics. D, Applied physics (06.02.2013)
Get full text
Journal Article
Characteristics and performance of Cr 2O 3/CrN double-layered coatings deposited by cathodic arc plasma deposition
Hsu, Cheng-Hsun, Huang, Dung-Hau, Ho, Wei-Yu, Huang, Li-Tien, Chang, Chi-Lung
Published in Materials science & engineering. A, Structural materials : properties, microstructure and processing (2006)
Published in Materials science & engineering. A, Structural materials : properties, microstructure and processing (2006)
Get full text
Journal Article
In-situ nitridation of gate dielectric for semiconductor devices
HUANG LI-TIEN, WANG CHIN-KUN, TSAI CHIA-MING, CHANG YU-MIN, CHI LIANGN, CHEN MIIN-JANG
Year of Publication 24.11.2015
Get full text
Year of Publication 24.11.2015
Patent
IN-SITU NITRIDATION OF GATE DIELECTRIC FOR SEMICONDUCTOR DEVICES
HUANG LI-TIEN, WANG CHIN-KUN, TSAI CHIA-MING, CHANG YU-MIN, CHI LIANGN, CHEN MIIN-JANG
Year of Publication 21.08.2014
Get full text
Year of Publication 21.08.2014
Patent
PROBE STRUCTURES AND METHOD FOR FABRICATING THE SAME
HUANG, JIA HONG, WANG, HSIANG BI, FU, MEI JUNG, HUANG, LI TIEN, TENG, CHUN YI
Year of Publication 01.12.2015
Get full text
Year of Publication 01.12.2015
Patent
Probe structures and method for fabricating the same
HUANG, LI-TIEN, TENG, CHUN-YI, FU, MEI-JUNG, HUANG, JIA-HONG, WANG, HSIANG-BI
Year of Publication 16.07.2015
Get full text
Year of Publication 16.07.2015
Patent