Supercritical CO/sub 2/ clean with novel solution for 65 nm and beyond BEOL performance improvement
Tseng, W.H., Yang, C.M., Wu, W.J., Wang, C.Y., Hu, J.C., Hsiung, C.H., Lin, Y.L., Bao, T.I., Yang, J.L., Shieh, J.H., Jeng, C.C., Lin, J.C., Huang, I.L., Chen, H.C., Lo, H., Wang, J., Yu, C.H., Liang, M.S.
Published in Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005 (2005)
Published in Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005 (2005)
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