Advanced 'contact engineering' for submicron VLSI multilevel metallization
Young, K.K., Riley, P.E., Uesato, W., Whetten, T.J., Hu, H.K., Ray, G.W., Peng, S., Chiu, K.-Y.
Published in IEEE transactions on semiconductor manufacturing (01.02.1993)
Published in IEEE transactions on semiconductor manufacturing (01.02.1993)
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Journal Article
SCOPE-a simultaneous contact and planarization etch process for low-cost high-performance CMOS applications
Young, K.K., Uesato, W., Hu, H.K., Riley, P.E., Peng, S.S., Chiu, K.Y.
Published in 1991 International Symposium on VLSI Technology, Systems, and Applications - Proceedings of Technical Papers (1991)
Published in 1991 International Symposium on VLSI Technology, Systems, and Applications - Proceedings of Technical Papers (1991)
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Conference Proceeding
Low-resistance CVD W plug on Ti silicide for advance CMOS applications
Young, K.K., Bradbury, D.R., Uesato, W., Hu, H.K., Kruger, J.B., Chiu, K.Y.
Published in International Technical Digest on Electron Devices (1990)
Published in International Technical Digest on Electron Devices (1990)
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Conference Proceeding