Advanced Spectroscopic Ellipsometry Application for Multi-Layers Sige At 28nm Node and Beyond
Hsuan, Teng-Chun, Hu, Yi-Cheng, Hsu, Single, Zhan, Dian-Zhen, Lin, Avery, Yu, Stan, Chien, Chin-Cheng, Chang, Shao-Ju, Chiu, Sheng-Min, Huang, Chien-Jen, Cheng, Chao-Yu, Cheng, Juli, Raphael, Getin, Jiang, Zhiming, Carlos, Ygartua, Tan, Zhengquan
Published in Meeting abstracts (Electrochemical Society) (27.10.2013)
Published in Meeting abstracts (Electrochemical Society) (27.10.2013)
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Development of a Production Worthy Non-Selective Slurry W-CMP for Logic Applications at 28nm Technology Node and Beyond
Hsu, Single, Hsieh, Duckblood, Chen, Jora, Lin, Welch, Tsai, Teng-Chun, Wu, J.Y.
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
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Journal Article