Luminescence and structural properties of silicon-rich nitride by X-ray absorption spectroscopy
Hsiao, H.L., Yang, A.B., Hwang, H.L.
Published in The Journal of physics and chemistry of solids (01.02.2008)
Published in The Journal of physics and chemistry of solids (01.02.2008)
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Initial stages of ultra thin Ti film growth on Si(1 1 1)-7×7 surface
Hsu, H.F., Lu, M.C., Fang, C.K., Chen, L.J., Hsiao, H.L., Pi, T.W.
Published in Thin solid films (20.03.2003)
Published in Thin solid films (20.03.2003)
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Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution
Hsiao, H.L, Hwang, H.L, Yang, A.B, Chen, L.W, Yew, T.R
Published in Applied surface science (01.04.1999)
Published in Applied surface science (01.04.1999)
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Electrical and structural properties of low temperature boron- and phosphorus-doped polycrystalline silicon thin films prepared by ECR-CVD
Hsiao, H.L, Shieh, Y.Y, Lee, R.S, Wang, R.Y, Wang, K.C, Hwang, H.L, Yang, A.B
Published in Applied surface science (01.04.1999)
Published in Applied surface science (01.04.1999)
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