Search Results - "Hoyer, Ronald" :: K.UTB vyhledávací portál

A New Approach for FEOL Critical Wafer Surface Cleaning

by Fischer, Thomas, Puri, Suraj, Hoyer, Ronald, Wostyn, Kurt L., Janssens, Tom
Published in ECS transactions (28.09.2007)

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Auditory and visual similarity effects in recognition and recall

by Connor, J M, Hoyer, R G
Published in Memory & cognition (01.05.1976)

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Method and system for fabricating free-standing nanostructures

by HOYER, RONALD, DUPONT, AUDREY
Year of Publication 11.05.2007

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METHOD OF MANUFACTURING SELF-SUPPORTING TYPE NANO STRUCTURE PART AND ITS SYSTEM

by HOYER RONALD, AUDREY DUPONT
Year of Publication 07.09.2006

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Method and system for fabricating and cleaning free-standing nanostructures

by HOYER RONALD, DUPONT AUDREY
Year of Publication 31.08.2006

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METHOD AND SYSTEM FOR FABRICATING FREE-STANDING NANOSTRUCTURES

by HOYER RONALD, DUPONT AUDREY
Year of Publication 30.08.2006

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Method and system for fabricating free-standing nanostructures

by DUPONT AUDREY,HOYER RONALD
Year of Publication 30.08.2006

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Method and system for fabricating free-standing nanostructures

by Dupont, Audrey, Hoyer, Ronald
Year of Publication 07.03.2006

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Method and system for fabricating free-standing nanostructures

by HOYER RONALD, DUPONT AUDREY
Year of Publication 07.03.2006

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Method for treating semiconductor wafer used for manufacture of solar cell, involves subjecting two saw-rough surfaces of semiconductor wafer to isotropic etching for removing crystal defect, crystal damage and/or contamination

by SCHERFF, MAXIMILIAN, HOYER, RONALD
Year of Publication 11.04.2013

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ZELLE ZUR MESSUNG DER KONZENTRATION EINER KOMPONENTE EINER ZWEI-KOMPONENTEN FLÜSSIGKEITSMISCHUNG, EINE VORRICHTUNG UND EINE ÄTZANLAGE

by OTTOW, STEFAN, STIEHL, HANS ULRICH, HOYER, RONALD
Year of Publication 15.05.2007

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Sensor cell for measuring the concentration of a component in a two component liquid mixture, apparatus and etching system

by OTTOW, STEFAN, STIEHL, HANS ULRICH, HOYER, RONALD
Year of Publication 18.04.2007

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DEVICE FOR PERFORMING SURFACE TREATMENT ON SEMICONDUCTOR WAFERS

by JAHANBANI, MOHAMAD, HOYER, RONALD, RUEMMELIN, STEFAN
Year of Publication 09.08.2006

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A New Approach for FEOL Critical Wafer Surface Cleaning

by Fischer, Thomas, Puri, Suraj, Hoyer, Ronald, Wostyn, Kurt L., Janssent, Tom
Published in Meeting abstracts (Electrochemical Society) (28.09.2007)

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DEVICE FOR PERFORMING SURFACE TREATMENT ON SEMICONDUCTOR WAFERS

by JAHANBANI, MOHAMAD, HOYER, RONALD, RUEMMELIN, STEFAN
Year of Publication 14.04.2004

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Improved integrated multi-layer test pads and methods therefor

by DAVIES, WILLIAM, ALSWEDE, FRANK, MENDELSON, RON, HOYER, RONALD, PREIN, FRANK
Year of Publication 05.09.2007

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Device for performing surface treatment on semiconductor wafers

by JAHANBANI, MOHAMAD, HOYER, RONALD, RUEMMELIN, STEFAN
Year of Publication 01.01.2004

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DEVICE FOR PERFORMING SURFACE TREATMENT ON SEMICONDUCTOR WAFERS

by JAHANBANI, MOHAMAD, HOYER, RONALD, RUEMMELIN, STEFAN
Year of Publication 16.10.2003

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Method and system for fabricating free-standing nanostructures

by HOYER, RONALD, DUPONT, AUDREY
Year of Publication 16.09.2006

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Device for performing surface treatment on semiconductor wafers

by Jahanbani, Mohamad, Ruemmelin, Stefan, Hoyer, Ronald
Year of Publication 20.05.2003

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