Organic Materials Challenges for 193 nm Imaging
Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Frank M
Published in Accounts of chemical research (17.08.1999)
Published in Accounts of chemical research (17.08.1999)
Get full text
Journal Article
193 nm Immersion Lithography - Taking The Plunge
Dammel, Ralph, Houlihan, Frank M., Sakamuri, Raj, Rentkiewicz, David, Romano, Andrew
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Get full text
Journal Article
Advances in Resist Materials for 193nm Lithography
Bowden, Murrae J., Gabor, Allen H., Dimov, Ognian, Medina, Arturo N., Foster, Patrick, Steinhäusler, Thomas, Biafore, John J., Spaziano, Gregory, Slater, Sydney G., Blakeney, Andrew J., Neisser, Mark O., Houlihan, Frank M., Cirelli, Ray A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Om, Reichmanis, Elsa
Published in Journal of Photopolymer Science and Technology (30.05.1999)
Published in Journal of Photopolymer Science and Technology (30.05.1999)
Get full text
Journal Article
Advances in Resist Materials for 193 nm Lithography
Bowden, Murrae J., Gabor, Allen H., Dimov, Ognian, Medina, Arturo N., Foster, Patrick, Steinhäusler, Thomas, Biafore, John J., Spaziano, Gregory, Slater, Sydney G., Blakeney, Andrew J., Neisser, Mark O., Houlihan, Frank M., Cirelli, Ray A., Dabbagh, Gary, Hutton, Richard S., Rushkin, Ilya L., Sweeney, James R., Timko, Allen G., Nalamasu, Om, Reichmanis, Elsa
Published in Journal of photopolymer science and technology (1999)
Published in Journal of photopolymer science and technology (1999)
Get full text
Journal Article
Leaching Phenomena and their Suppresion in 193 nm Immersion Lithography
Dammel, Ralph R., Pawlowski, Georg, Romano, Andrew, Hoolihan, Frank M., Kim, Woo-Kyu, Sakmuri, Raj, Abdallah, David, Padmanaban, Murirathna, Rahman, M. Dalil, McKenzie, Douglas
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Get full text
Journal Article