Tunneling component suppression in charge pumping measurement and reliability study for high- k gated MOSFETs
Lu, Chun-Chang, Chang-Liao, Kuei-Shu, Lu, Chun-Yuan, Chang, Shih-Cheng, Wang, Tien-Ko, Hou, Fu-Chung, Hsu, Yao-Tung
Published in Microelectronics and reliability (01.12.2011)
Published in Microelectronics and reliability (01.12.2011)
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Journal Article
Process Engineering and Trap Distribution for Dielectric/Si Interfacial Layer in High-k Gated MOS Devices
Chang-Liao, Kuei-Shu, Fu, Chung-Hao, Lu, Chun-Chang, Chang, Yu-An, Hsu, Ya-Yin, Tsao, Che-Hao, Wang, Tien-Ko, Heh, Da-Wei, Li, Y.C., Tsai, Wen-Fa, Ai, Chi-Fong, Hou, Fu-Chung, Hsu, Yao-Tung
Published in ECS transactions (01.01.2011)
Published in ECS transactions (01.01.2011)
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Journal Article
GIDL and F-N tunneling current correction on charge pumping techniques for profiling traps in high-k gated MOSFETs
Chun-Chang Lu, Kuei-Shu Chang-Liao, Fu-Huan Tsai, Che-Hao Tsao, Tien-Ko Wang, Fu-Chung Hou, Yao-Tung Hsu
Published in 2011 International Semiconductor Device Research Symposium (ISDRS) (01.12.2011)
Published in 2011 International Semiconductor Device Research Symposium (ISDRS) (01.12.2011)
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