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"Hotzel Arthur"
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"Hotzel Arthur"
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Electron dynamics of image potential states in weakly bound adsorbate layers: A short review
by
Hotzel
,
Arthur
Published in
Progress in surface science
(2007)
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Electron dynamics of image potential states in weakly bound adsorbate layers : A short review: Dynamics of electron transfer processes at surfaces
by
HOTZEL
,
Arthur
Published in
Progress in surface science
(2007)
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In-situ contactless monitoring of photomask pellicle degradation
by
Hotzel
,
Arthur
,
Riviere, Remi
Year of Publication
25.12.2018
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Reticle defect correction by second exposure
by
HOTZEL ARTHUR
Year of Publication
07.07.2015
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Reticle defect correction by second exposure
by
HOTZEL ARTHUR
Year of Publication
14.04.2015
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RETICLE DEFECT CORRECTION BY SECOND EXPOSURE
by
HOTZEL ARTHUR
Year of Publication
04.09.2014
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Reticle defect correction by second exposure
by
HOTZEL ARTHUR
Year of Publication
22.07.2014
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Mechanical fixture of pellicle to lithographic photomask
by
HOTZEL ARTHUR
Year of Publication
25.03.2014
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Manipulation and Characterization of Xenon−Metalloporphyrin Complexation with a Scanning Tunneling Microscope
by
Qiu, Xiaohui
,
Nazin, Gueorgui V
,
Hotzel
,
Arthur
,
Ho, Wilson
Published in
Journal of the American Chemical Society
(11.12.2002)
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Lithographic CD correction by second exposure
by
HOTZEL ARTHUR
Year of Publication
05.11.2013
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Lithographic CD correction by second exposure
by
HOTZEL ARTHUR
Year of Publication
08.10.2013
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IN-SITU CONTACTLESS MONITORING OF PHOTOMASK PELLICLE DEGRADATION
by
HOTZEL Arthur
,
RIVIERE Remi
Year of Publication
04.05.2017
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Vapor clean for haze and particle removal from lithographic photomasks
by
HOTZEL ARTHUR
Year of Publication
27.08.2013
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RETICLE DEFECT CORRECTION BY SECOND EXPOSURE
by
HOTZEL ARTHUR
Year of Publication
01.08.2013
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LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE
by
HOTZEL ARTHUR
Year of Publication
28.03.2013
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LITHOGRAPHIC CD CORRECTION BY SECOND EXPOSURE
by
HOTZEL ARTHUR
Year of Publication
28.03.2013
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RETICLE DEFECT CORRECTION BY SECOND EXPOSURE
by
HOTZEL ARTHUR
Year of Publication
28.03.2013
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VAPOR CLEAN FOR HAZE AND PARTICLE REMOVAL FROM LITHOGRAPHIC PHOTOMASKS
by
HOTZEL ARTHUR
Year of Publication
07.06.2012
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MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK
by
HOTZEL ARTHUR
Year of Publication
07.06.2012
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Methods including a processing of wafers and spin coating tool
by
Hotzel Arthur
,
Maehr Torsten
,
Freitag Martin
Year of Publication
16.05.2017
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