Ultraclean technique for silicon wafer surfaces with HNO3-HF systems
TAKIZAWA, R, NAKANISHI, T, HONDA, K, OHSAWA, A
Published in Japanese journal of applied physics (1988)
Published in Japanese journal of applied physics (1988)
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Journal Article
Ultraclean Technique for Silicon Wafer Surfaces with HNO 3 -HF Systems
Takizawa, Ritsuo, Nakanishi, Toshiro, Honda, Kouichirou, Ohsawa, Akira
Published in Japanese Journal of Applied Physics (01.11.1988)
Published in Japanese Journal of Applied Physics (01.11.1988)
Get full text
Journal Article