Selective Area Morphology Control of Self-Assembled Patterns using Silsesquioxane-containing Block Copolymers
Ushiro, Suguru, Mikami, Haruka, Sato, Mizuki, Hirano, Chiharu, Suzuki, Yoshinori, Maeda, Lina, Ishida, Yoshihito, Hayakawa, Teruaki, Aida, Kohei, Tada, Yasuhiko, Yoshida, Hiroshi
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Perpendicular orientation control in thin films of POSS-containing block copolymer domains with a top-coat surface treatment
Seshimo, Takehiro, Utsumi, Yoshiyuki, Dazai, Takahiro, Maehashi, Takaya, Matsumiya, Tasuku, Suzuki, Yoshinori, Hirano, Chiharu, Maeda, Rina, Ohmori, Katsumi, Hayakawa, Teruaki
Published in Polymer journal (01.04.2016)
Published in Polymer journal (01.04.2016)
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