Deposition of Pure Hydrogenated Amorphous Silicon by Plasma-Enhanced Chemical Vapor Deposition for Polycrystalline Silicon Thin Film Transistors
Hiramatsu, Masato, Kimura, Yoshinobu, Jyumonji, Masayuki, Nishitani, Mikihiko, Matsumura, Masakiyo
Published in Japanese Journal of Applied Physics (01.06.2005)
Published in Japanese Journal of Applied Physics (01.06.2005)
Get full text
Journal Article
Optimum Light Intensity Distribution for Growing Large Si Grains by Phase-Modulated Excimer-Laser Annealing
Jyumonji, Masayuki, Kimura, Yoshinobu, Taniguchi, Yukio, Hiramatsu, Masato, Ogawa, Hiroyuki, Matsumura, Masakiyo
Published in Japanese Journal of Applied Physics (01.02.2004)
Published in Japanese Journal of Applied Physics (01.02.2004)
Get full text
Journal Article