High performance and highly reliable deep submicron CMOSFETs using nitrided-oxide
Irino, K., Tamura, Y., Ohkubo, S., Nakanishi, T., Shigeno, M., Hikazutani, K.-I., Higashi, M., Fukuda, T., Takasaki, K.
Published in 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325) (1999)
Published in 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325) (1999)
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