Growth and characterization of an In0.53Ga0.47As-based Metal-Oxide-Semiconductor Capacitor (MOSCAP) structure on 300mm on-axis Si (001) wafers by MOCVD
Orzali, Tommaso, Vert, Alexey, Kim, Tae-Woo, Hung, P.Y., Herman, Joshua L., Vivekanand, Saikumar, Huang, Gensheng, Kelman, Max, Karim, Zia, Hill, Richard J.W., Rao, Satyavolu S. Papa
Published in Journal of crystal growth (01.10.2015)
Published in Journal of crystal growth (01.10.2015)
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Journal Article
Growth and characterization of an In sub(0.53)Ga sub(0.47)As-based Metal-Oxide-Semiconductor Capacitor (MOSCAP) structure on 300 mm on-axis Si (001) wafers by MOCVD
Orzali, Tommaso, Vert, Alexey, Kim, Tae-Woo, Hung, P Y, Herman, Joshua L, Vivekanand, Saikumar, Huang, Gensheng, Kelman, Max, Karim, Zia, Hill, Richard JW, Rao, Satyavolu S Papa
Published in Journal of crystal growth (01.01.2015)
Published in Journal of crystal growth (01.01.2015)
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Journal Article
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Year of Publication 26.05.2015
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ADVANCED LOW k CAP FILM FORMATION PROCESS FOR NANO ELECTRONIC DEVICES
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Advanced low k cap film formation process for nano electronic devices
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ADVANCED LOW k CAP FILM FORMATION PROCESS FOR NANO ELECTRONIC DEVICES
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ADVANCED LOW k CAP FILM FORMATION PROCESS FOR NANO ELECTRONIC DEVICES
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Advanced low k cap film formation process for nano electronic devices
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Year of Publication 03.07.2012
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Advanced low k cap film formation process for nano electronic devices
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Year of Publication 03.07.2012
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ADVANCED LOW k CAP FILM FORMATION PROCESS FOR NANO ELECTRONIC DEVICES
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Advanced multilayer dielectric cap with improved mechanical and electrical properties
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Year of Publication 10.09.2009
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