Antireflective coating for microlithography
MOREAU, WAYNE MARTIN, LINEHAN, LEO LAWRENCE, FAHEY, JAMES THOMAS, HERBST, BRIAN WAYNE, SPINILLO, GARY THOMAS
Year of Publication 11.01.2000
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Year of Publication 11.01.2000
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Antireflective coating for microlithography
WELSH KEVIN MICHAEL, FAHEY JAMES THOMAS, MOREAU WAYNE MARTIN, WOOD ROBERT LAVIN, LINEHAN LEO LAWRENCE, SPINILLO GARY THOMAS, HERBST BRIAN WAYNE
Year of Publication 27.03.2001
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Year of Publication 27.03.2001
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Antireflective coating for microlithography
MOREAU, WAYNE MARTIN, WELSH, KEVIN MICHAEL, LINEHAN, LEO LAWRENCE, FAHEY, JAMES THOMAS, HERBST, BRIAN WAYNE, SPINILLO, GARY THOMAS, WOOD, ROBERT LAVIN
Year of Publication 29.12.1999
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Year of Publication 29.12.1999
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Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used
MOREAU; WAYNE MARTIN, WELSH; KEVIN MICHAEL, LINEHAN; LEO LAWRENCE, SPINILLO; GARY THOMAS, WOOD; ROBERT LAVIN, FAHEY; JAMES THOMAS, HERBST; BRIAN WAYNE
Year of Publication 07.04.1998
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Year of Publication 07.04.1998
Patent
Antireflective coating for microlithography
MOREAU, WAYNE MARTIN, WELSH, KEVIN MICHAEL, LINEHAN, LEO LAWRENCE, FAHEY, JAMES THOMAS, HERBST, BRIAN WAYNE, SPINILLO, GARY THOMAS, WOOD, ROBERT LAVIN
Year of Publication 28.02.1996
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Year of Publication 28.02.1996
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Reflexvermindernde Schicht für die Mikrolithographie
MOREAU, WAYNE MARTIN, WELSH, KEVIN MICHAEL, LINEHAN, LEO LAWRENCE, FAHEY, JAMES THOMAS, HERBST, BRIAN WAYNE, SPINILLO, GARY THOMAS, WOOD, ROBERT LAVIN
Year of Publication 21.06.2000
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Year of Publication 21.06.2000
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