A yield improvement program using process control and process optimisation for particle reduction using in situ particle monitoring on a Semitool Magnum
Vogels, L.J.P., Dohmen, M.W.C., van Duijvenboden, P., Latimer, R.A., Heffernan, J.D.O.
Published in Proceedings 1998 IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (Cat. No.98EX223) (1998)
Published in Proceedings 1998 IEEE International Symposium on Defect and Fault Tolerance in VLSI Systems (Cat. No.98EX223) (1998)
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