Search Results - "Hecht, Hannes" :: K.UTB vyhledávací portál

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기판 웨이퍼 상에 반도체 재료의 층을 퇴적하기 위한 장치 및 방법

by HECHT HANNES
Year of Publication 27.03.2023

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에피택시 반응기에서의 반도체 웨이퍼를 취급하는 장치 및 에피택셜 층을 갖는 반도체 웨이퍼를 제조하는 방법

by MOOS PATRICK, HECHT HANNES
Year of Publication 13.03.2019

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퇴적 반응기의 챔버 내에서 에피택셜층을 가진 반도체 웨이퍼를 생산하기 위한 방법

by EDMAIER WALTER, LICHTENEGGER KORBINIAN, HECHT HANNES, LAUER MICHAEL
Year of Publication 06.11.2023

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반도체 물질로 제조된 기판 웨이퍼 상에 에피택셜층을 성막하기 위한 방법 및 장치

by STETTNER THOMAS, EDMAIER WALTER, LICHTENEGGER KORBINIAN, HECHT HANNES
Year of Publication 09.01.2023

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APPARATUS AND METHOD FOR DEPOSITING A LAYER OF SEMICONDUCTOR MATERIAL ON A SUBSTRATE WAFER

by HECHT, Hannes
Year of Publication 14.09.2023

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Device for handling a semiconductor wafer in an epitaxy reactor and method for producing a semiconductor wafer having an epitaxial layer

by Hecht, Hannes, Moos, Patrick
Year of Publication 12.04.2022

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Apparatus and method for depositing layer of semiconductor material on substrate wafer

by HECHT HANNES
Year of Publication 05.05.2023

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Apparatus and method for depositing a layer of semiconductor material on a substrate wafer

by HECHT, HANNES
Year of Publication 21.10.2022

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APPARATUS VON HANDLING A SEMICONDUCTOR WAFER IN AN EPITAXY REACTOR AND METHOD FOR MANUFACTURING A SEMICONDUCTOR WAFER WITH AN EPITACTIC LAYER

by MOOS, Patrick, HECHT, Hannes
Year of Publication 02.09.2020

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Apparatus and method for depositing a layer of semiconductor material on a substrate wafer

by HECHT, HANNES
Year of Publication 01.06.2022

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APPARATUS AND METHOD FOR DEPOSITING A LAYER OF SEMICONDUCTOR MATERIAL ON A SUBSTRATE WAFER

by HECHT, Hannes
Year of Publication 17.02.2022

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DEVICE AND METHOD FOR DEPOSITING A LAYER OF SEMICONDUCTOR MATERIAL ON A SUBSTRATE WAFER

by Hecht, Hannes
Year of Publication 16.02.2022

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DEVICE FOR HANDLING A SEMICONDUCTOR WAFER IN AN EPITAXY REACTOR AND METHOD FOR PRODUCING A SEMICONDUCTOR WAFER HAVING AN EPITAXIAL LAYER

by MOOS, Patrick, HECHT, Hannes
Year of Publication 10.10.2019

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METHOD OF PRODUCING EPITAXIAL LAYER WAFERS IN A CHAMBER OF A DEPOSITION REACTOR

by Hecht, Hannes, Edmaier, Walter, Lauer, Michael, Lichtenegger, Korbinian
Year of Publication 09.05.2024

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APPARATUS FOR HANDLING A SEMICONDUCTOR WAFER IN AN EPITAXY REACTOR AND METHOD FOR PRODUCING A SEMICONDUCTOR WAFER HAVING AN EPITAXIAL LAYER

by MOOS, Patrick, HECHT, Hannes
Year of Publication 22.05.2019

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Device for Handling a Semiconductor Wafer in an Epitaxy Reactor and Method for Producing a Semiconductor Wafer Having an Epitaxial Layer

by MOOS, Patrick, HECHT, Hannes
Year of Publication 30.01.2019

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METHOD AND DEVICE FOR DEPOSITING AN EPITAXIAL LAYER ON A SUBSTRATE WAFER MADE OF SEMICONDUCTOR MATERIAL

by EDMAIER, Walter, HECHT, Hannes, STETTNER, Thomas, LICHTENEGGER, Korbinian
Year of Publication 08.06.2023

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Device for handling a semiconductor wafer in an epitaxy reactor and method for producing a semiconductor wafer having an epitaxial layer

by MOOS, PATRICK, HECHT, HANNES
Year of Publication 21.03.2019

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APPARATUS FOR HANDLING SEMICONDUCTOR WAFER IN EPITAXY REACTOR AND METHOD FOR PRODUCING SEMICONDUCTOR WAFER HAVING EPITAXIAL LAYER

by MOOS PATRICK, HECHT HANNES
Year of Publication 15.03.2019

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Epitaxiereaktor für die Abscheidung einer epitaktischen Schicht auf einem Substrat

by Hecht, Hannes, Bauer, Thomas
Year of Publication 20.09.2018

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