Search Results - "Hebb, J.P." :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

The effect of surface roughness on the radiative properties of patterned silicon wafers

The effect of surface roughness on the radiative properties of patterned silicon wafers

by Hebb, J.P., Jensen, K.F., Thomas, J.
Published in IEEE transactions on semiconductor manufacturing (01.11.1998)

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Journal Article Conference Proceeding

The effect of patterns on thermal stress during rapid thermal processing of silicon wafers

The effect of patterns on thermal stress during rapid thermal processing of silicon wafers

by Hebb, J.P., Jensen, K.F.
Published in IEEE transactions on semiconductor manufacturing (01.02.1998)

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Journal Article

System and method for controlling movement of a workpiece in a thermal processing system

System and method for controlling movement of a workpiece in a thermal processing system

by A. SHAJLL, B. MATTHEWS, J.P. HEBB
Year of Publication 07.01.2004

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Patent