Preparation of amorphous Ni–B alloy: the effect of feeding order, precursor salt, pH and adding rate
He, Yonggen, Qiao, Minghua, Hu, Huarong, Pei, Yan, Li, Hexing, Deng, Jingfa, Fan, Kangnian
Published in Materials letters (01.11.2002)
Published in Materials letters (01.11.2002)
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Journal Article
Surface properties and catalytic behaviors of WO3/SiO2 in selective oxidation of cyclopentene to glutaraldehyde
XIN XIA, RONGHUA JIN, YONGGEN HE, DENG, J.-F, HEXING LI
Published in Applied surface science (02.10.2000)
Published in Applied surface science (02.10.2000)
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Journal Article
Residue defect study on amorphous silicon film
Zhiyong Yang, Jialei Liu, Huanxin Liu, Yonggen He, Yong Huang
Published in 2017 China Semiconductor Technology International Conference (CSTIC) (01.03.2017)
Published in 2017 China Semiconductor Technology International Conference (CSTIC) (01.03.2017)
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Conference Proceeding
Post ion implantation photoresist residue removal study
Jialei Liu, Huanxin Liu, Yonggen He, Haihui Liang, Huojin Tu
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
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Conference Proceeding
Spectrometric ellipsometry application to optical metrology of Silicon-Germanium layer
Yonggen He, Zhenyu Wu, Lan Jin, Yi Huang, Hao Dong
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
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Conference Proceeding
Investigation of seal nitride process in 32nm beyond HK/MG technology
Youfeng He, Haifeng Zhu, Lan Jin, Huojin Tu, Jinghua Ni, Yonggen He, Jingang Wu
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
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Conference Proceeding
Optimization of 28nm HK/MG single wafer cleaning process
Haihui Liang, JiaLei Liu, HuanXin Liu, Yonggen He, Jingang Wu, Xiaojing Ge, Haigermoser, Christian
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
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Conference Proceeding
Investigation of embedded silicon germanium typical defect solution for advanced CMOS process
Huojin Tu, Yonggen He, Youfeng He, Jialei Liu, Lan Jin, Guohui Cai, Yu Liu, Yujian Huang
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
Published in 2016 China Semiconductor Technology International Conference (CSTIC) (01.03.2016)
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Conference Proceeding
Device performance improvement with implantation balancing energy contamination and productivity
Yonggen He, Guohui Cai, Zuyuan Zhou, Youfeng He, Jingang Wu, Zhang, David Wei, Ting Cai, Junfeng Lu, Ganming Zhao, Baonian Guo
Published in 2016 16th International Workshop on Junction Technology (IWJT) (01.05.2016)
Published in 2016 16th International Workshop on Junction Technology (IWJT) (01.05.2016)
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Conference Proceeding
Investigation of different post HK annealing impact on HK film property and device performance
Yonggen He, Zhang, David Wei, Hailong Liu, Yong Chen, Yu Guobing, Youfeng He, Lan Jin, Jiaqi Wu, Jie Zhao, Weiji Song, Yu Shaofeng, Jingang Wu
Published in 2014 20th International Conference on Ion Implantation Technology (IIT) (01.06.2014)
Published in 2014 20th International Conference on Ion Implantation Technology (IIT) (01.06.2014)
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Conference Proceeding
Millisecond anneal for ultra-shallow junction applications
Jiong-Ping Lu, Yonggen He, Yong Chen
Published in 2010 International Workshop on Junction Technology Extended Abstracts (01.05.2010)
Published in 2010 International Workshop on Junction Technology Extended Abstracts (01.05.2010)
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Conference Proceeding
Influence of Oxide Interlayer by TiN Metal Gate in High-k First CMOS Devices
He, Yonggen, Chen, Yong, Liu, Hailong, He, Youfeng, Wu, Jingang, Zhang, David Wei
Published in ECS journal of solid state science and technology (01.01.2017)
Published in ECS journal of solid state science and technology (01.01.2017)
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Journal Article
Investigation of groove surface induced by strain relaxation in selective epitaxy SiGe process
Lan Jin, Huojin Tu, Youfeng He, Jing Lin, Yonggen He, Wei Lu, Jingang Wu
Published in 2012 12th International Workshop on Junction Technology (01.05.2012)
Published in 2012 12th International Workshop on Junction Technology (01.05.2012)
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Conference Proceeding
Investigation of Si Implantation into ILD (Interlayer Dielectric) for film property modification
Yonggen He, Guohui Cai, Zuyuan Zhou, Youfeng He, Jie Zhao, Weiji Song, Shaofeng Yu, Jingang Wu, Jun Feng Lu, Ganming Zhao
Published in 2014 International Workshop on Junction Technology (IWJT) (01.05.2014)
Published in 2014 International Workshop on Junction Technology (IWJT) (01.05.2014)
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Conference Proceeding
A Comprehensive Study of SiGe Source/ Drain Local Stress by Nano Beam Diffraction
Jin, Lan, Tu, Huojin, He, Youfeng, He, Yonggen, Wu, Jingang
Published in ECS transactions (01.01.2013)
Published in ECS transactions (01.01.2013)
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Journal Article
Investigation of Poly Film Application in Advanced MOSFET Technology
He, You Feng, Zhu, Haifeng, Jin, Lan, He, Yonggen, Wu, Jingang
Published in ECS transactions (27.02.2014)
Published in ECS transactions (27.02.2014)
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Journal Article
Investigation of a Promising Chemical for BEOL Ultra Low K Cleaning of 28nm Node and Beyond
Hu, Chunzhou, Yuan, Zhugen, Liu, Huanxin, He, Yonggen, Song, Xinghua, Chen, LinLin, Wu, Jingang
Published in ECS transactions (27.02.2014)
Published in ECS transactions (27.02.2014)
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Journal Article
Investigation of SiGeB Epitaxy on Different Film Substrates
Jin, Lan, Tu, Huojin, He, Youfeng, Lin, Jing, Wu, Jiaqi, He, Yonggen, Wu, Jingang
Published in ECS transactions (27.02.2014)
Published in ECS transactions (27.02.2014)
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Journal Article