A Novel Approach to Reduce Damages in Gate Oxides Induced by Bias Sputtered Sio2 Deposition
Hazuki, Y., Moriya, T.
Published in 1985 Symposium on VLSI Technology. Digest of Technical Papers (01.05.1985)
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Published in 1985 Symposium on VLSI Technology. Digest of Technical Papers (01.05.1985)
Conference Proceeding
A planar metallization process - Its application to tri-level aluminum interconnection
Moriya, T., Shima, S., Hazuki, Y., Chiba, M., Kashiwagi, M.
Published in 1983 International Electron Devices Meeting (1983)
Published in 1983 International Electron Devices Meeting (1983)
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Conference Proceeding