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Published in ACS applied materials & interfaces (27.07.2016)
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REMOTE CAPACITIVELY COUPLED PLASMA SOURCE WITH IMPROVED ION BLOCKER
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Year of Publication 12.06.2023
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프로세스 챔버에서 이중 주파수 RF 전력을 사용하는 방법
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Year of Publication 02.06.2023
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Year of Publication 02.06.2023
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CFX LAYER TO PROTECT ALUMINUM SURFACE FROM OVER-OXIDATION
SINGH, Anup Kumar, HASSAN, Vinayak Vishwanath, KUMAR, Bhaskar, BALASUBRAMANIAN, Ganesh
Year of Publication 09.06.2022
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Year of Publication 09.06.2022
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Remote Capacitively Coupled Plasma Source with Improved Ion Blocker
Hassan, Vinayak Vishwanath, Kumar, Bhaskar, Balasubramanian, Ganesh, Shah, Vivek B
Year of Publication 11.11.2021
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Year of Publication 11.11.2021
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EXTREME ULTRAVIOLET MASK BLANK SYSTEM AND OPTICAL TRAIN FOR EUV LITHOGRAPHY SYSTEM
FOAD, Majeed A, HASSAN, Vinayak Vishwanath, BEASLEY, Cara, HOFMANN, Ralf
Year of Publication 25.08.2021
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Year of Publication 25.08.2021
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Remote capacitively coupled plasma source with improved ion blocker
Hassan, Vinayak Vishwanath, Kumar, Bhaskar, Balasubramanian, Ganesh, Shah, Vivek B
Year of Publication 20.07.2021
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Year of Publication 20.07.2021
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STRESS TREATMENTS FOR COVER WAFERS
Hassan, Vinayak Vishwanath, Kumar, Bhaskar, Alayavalli, Kaushik, Cai, Meng, Nguyen, Andrew, Musunuru, Sowjanya
Year of Publication 02.03.2023
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Year of Publication 02.03.2023
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