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Maximizing Boron Activation in Solid Phase Epitaxy - A Case of Implant Choice and RTP Processing
by
Funk, K.
,
Verheyden, K.
,
Krull, W.
,
Pages, X.
,
Hapert
,
Jv
,
Granneman, E.
Published in
2006 International Workshop on Junction Technology
(2006)
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Conference Proceeding
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Conference Proceeding
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engineering
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annealing
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boron
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computer aided software engineering
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epitaxial growth
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europe
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helium
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IEL
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