Experimental investigation of the impact of LWR on sub-100-nm device performance
Hyun-Woo Kim, Ji-Young Lee, Shin, J., Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon
Published in IEEE transactions on electron devices (01.12.2004)
Published in IEEE transactions on electron devices (01.12.2004)
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Journal Article
Etching characteristics and modeling for oval-shaped contact
Park, Sung-Chan, Lim, Seok-Hyun, Shin, Chul-Ho, Min, Gyung-Jin, Kang, Chang-Jin, Cho, Han-Ku, Moon, Joo-Tae
Published in Thin solid films (23.04.2007)
Published in Thin solid films (23.04.2007)
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Journal Article
Conference Proceeding
Status of EUV Resist and Process Development at IC Manufacture to Implement EUV Lithography to 2X DRAM and Beyond
Kim, Hyun-Woo, Na, Hai-Sub, Park, Chang-Min, Park, Cheolhong, Kim, Sumin, Koh, Chawon, Kim, In-Sung, Cho, Han-Ku
Published in Journal of Photopolymer Science and Technology (01.01.2011)
Published in Journal of Photopolymer Science and Technology (01.01.2011)
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Journal Article
Most Efficient Alternative Manner of Patterning sub-80 nm Contact Holes and Trenches with 193 nm Lithography
Hah, Jung Hwan, Yoon, Jin-Young, Hata, Mitsuhiro, Kim, Sang Wook, Kim, Hyun-Woo, Woo, Sang-Gyoun, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Ryu, Byoung-Il
Published in Japanese Journal of Applied Physics (01.06.2004)
Published in Japanese Journal of Applied Physics (01.06.2004)
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Journal Article
Quantitative Evaluation of Grid Size Effect on Critical Dimension Uniformity Improvement
Lee, Doo-Youl, Lee, Sung-Woo, Yeo, Gi-Sung, Lee, Jung-Hyeon, Cho, Han-Ku, Han, Woo-Sung
Published in Japanese Journal of Applied Physics (01.06.2004)
Published in Japanese Journal of Applied Physics (01.06.2004)
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Journal Article
A New Method for Line Width Roughness Mitigation
Mayya, K. Subramanya, Yool, Kang, Kim, Hochul, Cho, Han-Ku
Published in Japanese Journal of Applied Physics (01.06.2011)
Published in Japanese Journal of Applied Physics (01.06.2011)
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Journal Article
A New Method for Line Width Roughness Mitigation
Mayya, K. Subramanya, Yool, Kang, Kim, Hochul, Cho, Han-Ku
Published in Japanese Journal of Applied Physics (01.06.2011)
Published in Japanese Journal of Applied Physics (01.06.2011)
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Journal Article
Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask
Lee, Seung-ho, Kang, Bong-kyun, Kim, Min-su, Ahn, Jin-ho, Cho, Han-ku, Lee, Han-shin, Park, Jin-Goo
Published in Japanese Journal of Applied Physics (01.09.2012)
Published in Japanese Journal of Applied Physics (01.09.2012)
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Journal Article
Carbon contamination analysis and its effect on extreme ultra violet mask imaging performance using coherent scattering microscopy/in-situ accelerated contamination system
Jeong, Chang Young, Lee, Sangsul, Doh, Jong Gul, Lee, Jae Uk, Cha, Han-sun, Nichols, William T, Lee, Dong Gun, Kim, Seong Sue, Cho, Han Ku, Rah, Seung-yu, Ahn, Jinho
Published in Journal of nanoscience and nanotechnology (01.07.2011)
Published in Journal of nanoscience and nanotechnology (01.07.2011)
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Journal Article
ArF Bi-layer Resist for sub-90nm L/S Fabrication
Kim, Hyun-Woo, Hong, J., Jung, Myung-Ho, Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung
Published in Journal of photopolymer science and technology (2003)
Published in Journal of photopolymer science and technology (2003)
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Journal Article
Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask
Lee, Seung-ho, Kang, Bong-kyun, Kim, Min-su, Ahn, Jin-ho, Cho, Han-ku, Lee, Han-shin, Park, Jin-Goo
Published in Japanese Journal of Applied Physics (01.09.2012)
Published in Japanese Journal of Applied Physics (01.09.2012)
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Journal Article
Analsysis of Process Parameters to Improve In-Chip Linewidth Variation
Yun-Kyeong Jang, Doo-Youl Lee, Sung-Woo Lee, Eun-Mi Lee, Soo-Han Choi, Yool Kang, Gi-Sung Yeo, Sang-Gyun Woo, Han-Ku Cho, Jong-Rak Park
Published in Journal of semiconductor technology and science (2004)
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Published in Journal of semiconductor technology and science (2004)
Journal Article
Which Mask is Preferred for Sub-60 nm Node Imaging?
Kim, Sung-Hyuck, Kim, Soon-Ho, Kim, Yong-Hoon, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Oh, Hye-Keun
Published in Japanese Journal of Applied Physics (01.09.2007)
Published in Japanese Journal of Applied Physics (01.09.2007)
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Journal Article
Double-Patterning Technique Using Plasma Treatment of Photoresist
Lee, Doo-Youl, Kang, Yool, Chae, Yun-Sook, Lee, Suk-Joo, Cho, Han-Ku, Moon, Joo-Tae
Published in Japanese Journal of Applied Physics (01.09.2007)
Published in Japanese Journal of Applied Physics (01.09.2007)
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Journal Article
Development and evaluation of highly efficient neutral beam source
Hwang, Sung-Wook, Lee, Do-Haing, Shin, Chul Ho, Tokashiki, Ken, Min, Gyeong-Jin, Kang, Chang Jin, Cho, Han Ku, Moon, Joo Tae, Lee, Jinseok, Jeon, Yunkwang, Lee, Yvette, Kam, Doyoung
Published in Surface & coatings technology (05.08.2007)
Published in Surface & coatings technology (05.08.2007)
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Journal Article
Conference Proceeding