Soluble polycyclosilane–polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity
Park, Sung Jin, Cho, Hyeon Mo, Lee, Myong Euy, Kim, Miyoung, Han, Kwenwoo, Hong, Seunghee, Lim, Sanghak, Lee, Hansong, Hwang, Byeonggyu, Kim, Sang Kyun, Shim, Sangdeok, Kang, Philjae, Choi, Moon-Gun
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (01.01.2015)
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (01.01.2015)
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Soluble polycyclosilane-polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivityElectronic supplementary information (ESI) available: Experimental procedures, products characterization data, NMR (1H, 13C, 29Si) spectra, extinction coefficient (k), and details of X-ray crystallographic data. CCDC 984675 and 984676. For ESI and crystallographic data in CIF or other electronic format See DOI: 10.1039/c4tc01917b
Park, Sung Jin, Cho, Hyeon Mo, Lee, Myong Euy, Kim, Miyoung, Han, Kwenwoo, Hong, Seunghee, Lim, Sanghak, Lee, Hansong, Hwang, Byeonggyu, Kim, Sang Kyun, Shim, Sangdeok, Kang, Philjae, Choi, Moon-Gun
Year of Publication 11.12.2014
Year of Publication 11.12.2014
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