Search Results - "Han, Hak-Seung" :: K.UTB vyhledávací portál

Si nanocluster sensitization of Er-doped silica for optical amplet using top-pumping visible LEDs

by Shin, J.H., Jinku Lee, Hak-seung Han, Ji-Hong Jhe, Jee Soo Chang, Se-Young Seo, Hansuek Lee, Namkyoo Park
Published in IEEE journal of selected topics in quantum electronics (01.07.2006)

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Three-dimensional characterization of extreme ultraviolet mask blank defects by interference contrast photoemission electron microscopy

by Lin, Jingquan, Weber, Nils, Escher, Matthias, Maul, Jochen, Han, Hak-Seung, Merkel, Michael, Wurm, Stefan, Schönhense, Gerd, Kleineberg, Ulf
Published in Optics express (29.09.2008)

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Pattern uniformity measuring apparatus and method based on pupil image and mask manufacturing method using the measuring method

by HAN HAK SEUNG, PARK JIN BACK, KIM MIN HO, KIM JI YOUNG
Year of Publication 14.01.2022

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Patent

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EUV EUV Apparatus and method for measuring phase of EUVExtreme Ultraviolet Mask and method for fabricating EUV mask comprising the method

by PARK JONG JU, YI RAE WON, HAN HAK SEUNG, KIM SEONG SUE
Year of Publication 29.09.2021

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Patent

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Method of Annealing a Reflective Photomask Using LASER

by PARK SANG UK, PARK JONG JU, YI RAE WON, HAN HAK SEUNG
Year of Publication 30.07.2021

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Patent

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Apparatus for measuring mask error and method for measuring mask error

by CHUNG, DONG HOON, HAN, HAK SEUNG, LEE, DONG GUN
Year of Publication 08.03.2017

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Patent

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Optimization formulation and monotonic solution method for the Witsenhausen problem

by McEneaney, William M., Han, Seung Hak
Published in Automatica (Oxford) (01.05.2015)

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The principle of least action and two-point boundary value problems in orbital mechanics

by Seung Hak Han, McEneaney, William M.
Published in 2014 American Control Conference (01.06.2014)

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Conference Proceeding

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The principle of least action and fundamental solution of two-point boundary value problems in orbital mechanics

by Seung Hak Han, McEneaney, William M.
Published in 2014 European Control Conference (ECC) (01.06.2014)

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Conference Proceeding

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Fundamental Solutions for Two-Point Boundary Value Problems in Orbital Mechanics

by Han, Seung Hak, McEneaney, William M.
Published in Applied mathematics & optimization (01.02.2018)

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Journal Article

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METHOD OF CORRECTING AN OPTICAL PARAMETER IN A PHOTO MASK

by HAN, HAK SEUNG, NAM, DONG SEOK, WOO, SANG GYUN
Year of Publication 06.10.2011

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Patent

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METHOD OF ALIGNING AN OBJECT OF A MASK AND APPARATUS FOR PERFORMING THE SAME

by HAN, HAK SEUNG, PARK, JIN BACK, SHIN, IN KYUN
Year of Publication 07.10.2013

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Patent

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APPARATUS OF INSPECTING AND MEASURING REFLECTIVE PHOTOMASKS USING LIGHT

by HAN, HAK SEUNG, YOON, YOUNG KEUN, SHIN, IN KYUN
Year of Publication 07.10.2013

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Patent

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METHOD OF FORMING PHOTOMASK USING CALIBRATION PATTERN, AND PHOTOMASK HAVING CALIBRATION PATTERN

by HAN, HAK SEUNG, KIM, HEE BOM, YOON, YOUNG KEUN, LEE, MYOUNG SOO, JEON, CHAN UK
Year of Publication 20.07.2012

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Patent

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An optimization approach to the Witsenhausen counterexample

by McEneaney, W. M., Seung Hak Han, Liu, A.
Published in 2011 50th IEEE Conference on Decision and Control and European Control Conference (01.12.2011)

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Conference Proceeding