Copper Large-Scale Grain Growth by UV Nanosecond Pulsed Laser Annealing
Tabata, Toshiyuki, Raynal, Pierre-Edouard, Roze, Fabien, Halty, Sebastien, Thuries, Louis, Cristiano, Fuccio, Scheid, Emmanuel, Mazzamuto, Fulvio
Published in 2021 IEEE International Interconnect Technology Conference (IITC) (06.07.2021)
Published in 2021 IEEE International Interconnect Technology Conference (IITC) (06.07.2021)
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Conference Proceeding
Solid Phase Recrystallization in Arsenic Ion-Implanted Silicon-On-Insulator by Microsecond UV Laser Annealing
Tabata, Toshiyuki, Roze, Fabien, Acosta Alba, Pablo, Halty, Sebastien, Raynal, Pierre-Edouard, Karmous, Imen, Kerdiles, Sebastien, Mazzamuto, Fulvio
Published in IEEE journal of the Electron Devices Society (01.01.2022)
Published in IEEE journal of the Electron Devices Society (01.01.2022)
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Journal Article
UV Excimer Laser Annealing for Next Generation Power Electronics
Tabata, Toshiyuki, Halty, Sebastien, Toque-Tresonne, Ines, Mazzamuto, Fulvio, Huet, Karim, Mori, Yoshihiro
Published in 2016 21st International Conference on Ion Implantation Technology (IIT) (01.09.2016)
Published in 2016 21st International Conference on Ion Implantation Technology (IIT) (01.09.2016)
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Conference Proceeding
Deep junction by low thermal budget process for advanced Si power electronics
Toque-Tresonne, Ines, Tabata, Toshiyuki, Halty, Sebastien, Mazzamuto, Fulvio, Huet, Karim, Mori, Yoshihiro
Published in 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM) (01.02.2017)
Published in 2017 IEEE Electron Devices Technology and Manufacturing Conference (EDTM) (01.02.2017)
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Conference Proceeding
Non-doped HfO 2 crystallization controlled by dwell time in laser annealing
Tabata, Toshiyuki, Halty, Sebastien, Rozé, Fabien, Huet, Karim, Mazzamuto, Fulvio
Published in Applied physics express (01.11.2021)
Published in Applied physics express (01.11.2021)
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Journal Article
Non-doped HfO2 crystallization controlled by dwell time in laser annealing
Tabata, Toshiyuki, Halty, Sebastien, Rozé, Fabien, Huet, Karim, Mazzamuto, Fulvio
Published in Applied physics express (01.11.2021)
Published in Applied physics express (01.11.2021)
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Journal Article
Microsecond non-melt UV laser annealing for future 3D-stacked CMOS
Tabata, Toshiyuki, Rozé, Fabien, Thuries, Louis, Halty, Sebastien, Raynal, Pierre-Edouard, Huet, Karim, Mazzamuto, Fulvio, Joshi, Abhijeet, Basol, Bulent M., Alba, Pablo Acosta, Kerdilès, Sébastien
Published in Applied physics express (01.06.2022)
Published in Applied physics express (01.06.2022)
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Journal Article
Recent Progresses and Perspectives of UV Laser Annealing Technologies for Advanced CMOS Devices
Tabata, Toshiyuki, Rozé, Fabien, Thuries, Louis, Halty, Sébastien, Pierre-Edouard Raynal, Karmous, Imen, Huet, Karim
Published in arXiv.org (12.09.2022)
Published in arXiv.org (12.09.2022)
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Paper
Journal Article
Solid Phase Recrystallization and Dopant Activation in Arsenic Ion-Implanted Silicon-On-Insulator by UV Laser Annealing
Tabata, Toshiyuki, Rozé, Fabien, Alba, Pablo Acosta, Halty, Sébastien, Raynal, Pierre-Edouard, Karmous, Imen, Kerdilès, Sébastien, Mazzamuto, Fulvio
Year of Publication 15.11.2021
Year of Publication 15.11.2021
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Journal Article
Low Thermal Budget Ohmic Contact Formation by Laser Anneal
Tanimura, Hideaki, Mazzamuto, Fulvio, Halty, Sebastien, Mori, Yoshihiro
Published in Materials Science Forum (24.05.2016)
Published in Materials Science Forum (24.05.2016)
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Journal Article
Copper Large-scale Grain Growth by UV Nanosecond Pulsed Laser Annealing
Tabata, Toshiyuki, Pierre-Edouard Raynal, Rozé, Fabien, Halty, Sébastien, Thuries, Louis, Fuccio Cristiano, Scheid, Emmanuel, Mazzamuto, Fulvio
Published in arXiv.org (15.11.2021)
Published in arXiv.org (15.11.2021)
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Paper
Journal Article
Silicon Carbide Recrystallization Mechanism by Non-Equilibrium Melting Laser Anneal
Mazzamuto, Fulvio, Halty, Sebastien, Mori, Yoshihiro
Published in Materials Science Forum (24.05.2016)
Published in Materials Science Forum (24.05.2016)
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Journal Article
(Invited) Laser Thermal Annealing for Low Thermal Budget Applications: From Contact Formation to Material Modification
Huet, Karim, Tabata, Toshiyuki, Aubin, Joris, Rozé, Fabien, Thuries, Louis, Halty, Sebastien, Curvers, Benoit, Mazzamuto, Fulvio, Liu, J., Mori, Yoshihiro
Published in ECS transactions (23.04.2019)
Published in ECS transactions (23.04.2019)
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Journal Article
Advanced BEOL Materials, Processes, and Integration to Reduce Line Resistance of Damascene Cu, Co, and Subtractive Ru Interconnects
Nogami, Takeshi, Gluschenkov, Oleg, Sulehria, Yasir, Nguyen, Son, Peethala, Brown, Huang, Huai, Shobha, Hosadurga, Lanzillo, Nick, Patlolla, Raghuveer, Sil, Devika, Simon, Andrew, Edelstein, Daniel, Felix, Nelson, Liu, Junjun, Tabata, Toshiyuki, Mazzamuto, Fulvio, Halty, Sebastien, Roze, Fabien, Okuno, Yasutoshi, Uedono, Akira
Published in 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (12.06.2022)
Published in 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (12.06.2022)
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Conference Proceeding
Solid Phase Recrystallization and Dopant Activation in Arsenic Ion-Implanted Silicon-On-Insulator by UV Laser Annealing
Tabata, Toshiyuki, Rozé, Fabien, Pablo Acosta Alba, Halty, Sébastien, Pierre-Edouard Raynal, Karmous, Imen, Kerdilès, Sébastien, Mazzamuto, Fulvio
Published in arXiv.org (15.11.2021)
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Published in arXiv.org (15.11.2021)
Paper
Solid Phase Recrystallization in Arsenic Ion-Implanted Silicon-On-Insulator by Microsecond UV Laser Annealing
Tabata, Toshiyuki, Rozé, Fabien, Pablo Acosta Alba, Halty, Sebastien, Pierre-Edouard Raynal, Karmous, Imen, Kerdilés, Sébastien, Mazzamuto, Fulvio
Published in arXiv.org (26.04.2022)
Published in arXiv.org (26.04.2022)
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Paper
Journal Article
Solid Phase Recrystallization and Dopant Activation in Arsenic Ion-Implanted Silicon-On-Insulator by UV Laser Annealing
Tabata, Toshiyuki, Roze, Fabien, Alba, Pablo Acosta, Halty, Sebastien, Raynal, Pierre-Edouard, Karmous, Imen, Kerdiles, Sebastien, Mazzamuto, Fulvio
Published in 2021 20th International Workshop on Junction Technology (IWJT) (10.06.2021)
Published in 2021 20th International Workshop on Junction Technology (IWJT) (10.06.2021)
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Conference Proceeding
Microsecond non-melt UV laser annealing for future 3D-stacked CMOS
Tabata, Toshiyuki, Rozé, Fabien, Thuries, Louis, Halty, Sebastien, Pierre-Edouard Raynal, Huet, Karim, Mazzamuto, Fulvio, Joshi, Abhijeet, Basol, Bulent M, Pablo Acosta Alba, Kerdilès, Sébastien
Published in arXiv.org (10.05.2022)
Published in arXiv.org (10.05.2022)
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Journal Article