Multiple imprinting in UV-based nanoimprint lithography: related material issues
Bender, M., Otto, M., Hadam, B., Spangenberg, B., Kurz, H.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Conference Proceeding
Fabrication of nanostructures using a UV-based imprint technique
Bender, M., Otto, M., Hadam, B., Vratzov, B., Spangenberg, B., Kurz, H.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Characterization and application of a UV-based imprint technique
Otto, M., Bender, M., Hadam, B., Spangenberg, B., Kurz, H.
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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High-density silicon nanowire growth from self-assembled Au nanoparticles
Albuschies, J., Baus, M., Winkler, O., Hadam, B., Spangenberg, B., Kurz, H.
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Reproducibility and homogeneity in step and repeat UV-nanoimprint lithography
OTTO, M, BENDER, M, RICHTER, F, HADAM, B, KLIEM, T, JEDE, R, SPANGENBERG, B, KURZ, H
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Journal Article
Reproducibility and homogeneity in step and repeat UV-nanoimprint lithography
Otto, M., Bender, M., Richter, F., Hadam, B., Kliem, T., Jede, R., Spangenberg, B., Kurz, H.
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Concept of floating-dot memory transistors on silicon-on-insulator substrate
Winkler, O., Merget, F., Heuser, M., Hadam, B., Baus, M., Spangenberg, B., Kurz, H.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Conference Proceeding
Synthesis and characterization of boron–oxygen–hydrogen thin films at low temperatures
Music, D., Kölpin, H., Atiser, A., Kreissig, U., Bobek, T., Hadam, B., Schneider, J.M.
Published in Materials research bulletin (11.08.2005)
Published in Materials research bulletin (11.08.2005)
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Fabrication of wire-MOSFETs on silicon-on-insulator substrate
Heuser, M., Baus, M., Hadam, B., Winkler, O., Spangenberg, B., Granzner, R., Lemme, M., Kurz, H.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Structural and superconducting properties of Bi2-mPbmSr2Ca2Cu3O10-δ with 0≤m≤1
GÖTZ, D, HADAM, B, IDINK, H, HAHN, T, GÖBBELS, M, WOERMANN, E
Published in Physica. C, Superconductivity (10.02.1995)
Published in Physica. C, Superconductivity (10.02.1995)
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SiGe wires and dots grown by local epitaxy
Brunner, J., Schittenhelm, P., Gondermann, J., Spangenberg, B., Hadam, B., Köster, T., Roskos, H.G., Kurz, H., Gossner, H., Eisele, I., Abstreiter, G.
Published in Journal of crystal growth (01.05.1995)
Published in Journal of crystal growth (01.05.1995)
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New concept for ultra small N-MOSFET's
Gondermann, J., Schiepanski, J., Hadam, B., Köster, T., Röwer, T., Stein, J., Spangenberg, B., Roskos, H., Kurz, H.
Published in Microelectronic engineering (01.02.1997)
Published in Microelectronic engineering (01.02.1997)
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Electron beam lithography and ion implantation techniques for fabrication of high-Tc Josephson junctions
Barth, R., Hamidi, A.H., Hadam, B., Hollkott, J., Dunkmann, D., Auge, J., Kurz, H.
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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MOS-compatible fabrication and characterization of tunnel junctions in BESOI-material
Köster, T., Hadam, B., Goldschmidtböing, F., Hofmann, K., Gondermann, J., Stein, J., Hu, S., Altmeyer, S., Spangenberg, B., Kurz, H.
Published in Microelectronic engineering (1998)
Published in Microelectronic engineering (1998)
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Fabrication and characterisation of SiGe based in-plane-gate transistors
Köster, T., Stein, J., Hadam, B., Gondermann, J., Spangenberg, B., Roskos, H.G., Kurz, H., Holzmann, M., Riedinger, M., Abstreiter, G.
Published in Microelectronic engineering (01.02.1997)
Published in Microelectronic engineering (01.02.1997)
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Local epitaxy of Si/SiGe wires and dots
Brunner, J., Jung, W., Schittenhelm, P., Gail, M., Abstreiter, G., Gonderman, J., Hadam, B., Koester, T., Spangenberg, B., Roskos, H.G., Kurz, H., Gossner, H., Eisele, I.
Published in Journal of crystal growth (01.12.1995)
Published in Journal of crystal growth (01.12.1995)
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Investigation of Si/SiGe heterostructures patterned by reactive ion etching
KÖSTER, T, HADAM, B, GONDERMANN, J, SPANGENBERG, B, ROSKOS, H. G, KURZ, H, BRUNNER, J, ABSTREITER, G
Published in Microelectronic engineering (1996)
Published in Microelectronic engineering (1996)
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Fabrication and characterization of Si/SiGe nanometer structures
Gondermann, J., Spangenberg, B., Ko¨ster, T., Hadam, B., Roskos, H.G., Kurz, H., Brunner, J., Schittenhelm, P., Abstreiter, G., Goßner, H., Eisele, I.
Published in Microelectronic engineering (01.02.1995)
Published in Microelectronic engineering (01.02.1995)
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Fabrication of Monolithic Bidirectional Switch (MBS) devices with MOS-controlled emitter structures
Baus, M., Szafranek, B.N., Chmielus, S., Lemme, M.C., Hadam, B., Spangenberg, B., Sittig, R., Kurz, H.
Published in 2006 IEEE International Symposium on Power Semiconductor Devices and IC's (2006)
Published in 2006 IEEE International Symposium on Power Semiconductor Devices and IC's (2006)
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Conference Proceeding
Coulomb Blockade Effects in a Highly Doped Silicon Quantum Wire Fabricated on Novel Molecular Beam Epitaxy Grown Material
Koester, Thomas, Goldschmidtboeing, Frank, Hadam, Birgit, Stein, Josef, Altmeyer, Stefan, Spangenberg, Bernd, Kurz, Heinrich, Neumann, Robert, Brunner, Karl, Abstreiter, Gerd
Published in Japanese Journal of Applied Physics (01.01.1999)
Published in Japanese Journal of Applied Physics (01.01.1999)
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