Double line shrink lithography at k1 = 0.16
NOELSCHER, Christoph, HELLER, Marcel, HABETS, Boris, MARKERT, Matthias, SCHELER, Uli, MOLL, Peter
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Conference Proceeding
Journal Article
Double line shrink lithography at k 1 = 0.16
Noelscher, Christoph, Heller, Marcel, Habets, Boris, Markert, Matthias, Scheler, Uli, Moll, Peter
Published in Microelectronic engineering (2006)
Published in Microelectronic engineering (2006)
Get full text
Journal Article