Overview of atomic layer etching in the semiconductor industry
Kanarik, Keren J., Lill, Thorsten, Hudson, Eric A., Sriraman, Saravanapriyan, Tan, Samantha, Marks, Jeffrey, Vahedi, Vahid, Gottscho, Richard A.
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.03.2015)
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.03.2015)
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Book Review
Differential expression and responsiveness of chemokine receptors (CXCR1-3) by human microvascular endothelial cells and umbilical vein endothelial cells
Salcedo, R, Resau, J H, Halverson, D, Hudson, E A, Dambach, M, Powell, D, Wasserman, K, Oppenheim, J J
Published in The FASEB journal (01.10.2000)
Published in The FASEB journal (01.10.2000)
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Journal Article
Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment
Nest, Dustin, Chung, Ting-Ying, Graves, David B., Engelmann, Sebastian, Bruce, Robert L., Weilnboeck, Florian, Oehrlein, Gottlieb S., Wang, Deyan, Andes, Cecily, Hudson, Eric A.
Published in Plasma processes and polymers (14.10.2009)
Published in Plasma processes and polymers (14.10.2009)
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Journal Article
Selective Gas-Phase Functionalization of SiO2 and SiNx Surfaces with Hydrocarbons
Gasvoda, Ryan J, Xu, Wanxing, Zhang, Zhonghao, Wang, Scott, Hudson, Eric A, Agarwal, Sumit
Published in Langmuir (06.04.2021)
Published in Langmuir (06.04.2021)
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Journal Article
Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group
Chung, Ting-Ying, Graves, David B., Weilnboeck, Florian, Bruce, Robert L., Oehrlein, Gottlieb S., Li, Mingqi, Hudson, Eric A.
Published in Plasma processes and polymers (23.11.2011)
Published in Plasma processes and polymers (23.11.2011)
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Journal Article
Profile simulation of high aspect ratio contact etch
Kim, Doosik, Hudson, Eric A., Cooperberg, David, Edelberg, Erik, Srinivasan, Mukund
Published in Thin solid films (23.04.2007)
Published in Thin solid films (23.04.2007)
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Journal Article
Conference Proceeding
Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO2
Gasvoda, Ryan J, van de Steeg, Alex W, Bhowmick, Ranadeep, Hudson, Eric A, Agarwal, Sumit
Published in ACS applied materials & interfaces (13.09.2017)
Published in ACS applied materials & interfaces (13.09.2017)
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Journal Article
Selective Gas-Phase Functionalization of SiO 2 and SiN x Surfaces with Hydrocarbons
Gasvoda, Ryan J, Xu, Wanxing, Zhang, Zhonghao, Wang, Scott, Hudson, Eric A, Agarwal, Sumit
Published in Langmuir (06.04.2021)
Published in Langmuir (06.04.2021)
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Journal Article
Predicting synergy in atomic layer etching
Kanarik, Keren J., Tan, Samantha, Yang, Wenbing, Kim, Taeseung, Lill, Thorsten, Kabansky, Alexander, Hudson, Eric A., Ohba, Tomihito, Nojiri, Kazuo, Yu, Jengyi, Wise, Rich, Berry, Ivan L., Pan, Yang, Marks, Jeffrey, Gottscho, Richard A.
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.09.2017)
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01.09.2017)
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Journal Article
Investigation of thin oxide layer removal from Si substrates using an SiO2 atomic layer etching approach: the importance of the reactivity of the substrate
Metzler, Dominik, Li, Chen, Lai, C Steven, Hudson, Eric A, Oehrlein, Gottlieb S
Published in Journal of physics. D, Applied physics (28.06.2017)
Published in Journal of physics. D, Applied physics (28.06.2017)
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Journal Article
Gas Phase Organic Functionalization of SiO2 with Propanoyl Chloride
Gasvoda, Ryan J, Wang, Scott, Hausmann, Dennis M, Hudson, Eric A, Agarwal, Sumit
Published in Langmuir (04.12.2018)
Published in Langmuir (04.12.2018)
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Journal Article
Gas Phase Organic Functionalization of SiO 2 with Propanoyl Chloride
Gasvoda, Ryan J, Wang, Scott, Hausmann, Dennis M, Hudson, Eric A, Agarwal, Sumit
Published in Langmuir (04.12.2018)
Published in Langmuir (04.12.2018)
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Journal Article
Use of the ultraviolet absorption spectrum of CF2 to determine the spatially resolved absolute CF2 density, rotational temperature, and vibrational distribution in a plasma etching reactor
Bulcourt, Nicolas, Booth, Jean-Paul, Hudson, Eric A, Luque, Jorge, Mok, Daniel K W, Lee, Edmond P, Chau, Foo-Tim, Dyke, John M
Published in The Journal of chemical physics (22.05.2004)
Published in The Journal of chemical physics (22.05.2004)
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Journal Article
Investigation of thin oxide layer removal from Si substrates using an SiO 2 atomic layer etching approach: the importance of the reactivity of the substrate
Metzler, Dominik, Li, Chen, Lai, C Steven, Hudson, Eric A, Oehrlein, Gottlieb S
Published in Journal of physics. D, Applied physics (28.06.2017)
Published in Journal of physics. D, Applied physics (28.06.2017)
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Journal Article
Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO 2
Gasvoda, Ryan J, van de Steeg, Alex W, Bhowmick, Ranadeep, Hudson, Eric A, Agarwal, Sumit
Published in ACS applied materials & interfaces (13.09.2017)
Published in ACS applied materials & interfaces (13.09.2017)
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Journal Article
Identification of a lysosomal pathway that modulates glucocorticoid signaling and the inflammatory response
He, Yuanzheng, Xu, Yong, Zhang, Chenghai, Gao, Xiang, Dykema, Karl J, Martin, Katie R, Ke, Jiyuan, Hudson, Eric A, Khoo, Sok Kean, Resau, James H, Alberts, Arthur S, MacKeigan, Jeffrey P, Furge, Kyle A, Xu, H Eric
Published in Science signaling (05.07.2011)
Published in Science signaling (05.07.2011)
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Journal Article