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Published in Ai zheng (01.11.2012)
Published in Ai zheng (01.11.2012)
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Journal Article
New Approaches for Characterization of Advanced Annealing Techniques for Ultra-Shallow Junction Formation
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Published in Ion Implantation Technology 2008 (01.01.2008)
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Selective reflectivity process chamber with customized wavelength response and method
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Year of Publication 25.04.2017
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Year of Publication 25.04.2017
Patent
Selective reflectivity process chamber with customized wavelength response and method
Timans, Paul J, Devine, Daniel J, Lee, Young Jai, Hu, Yao Zhi, Bordiga, Peter C
Year of Publication 15.06.2010
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Year of Publication 15.06.2010
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Method and system for thermally processing a plurality of wafer-shaped objects
Nenyei, Zsolt, Timans, Paul J, Lerch, Wilfried, Niess, Jüergen, Falter, Manfred, Schmid, Patrick, O'Carroll, Conor Patrick, Cardema, Rudy, Fidelman, Igor, Tay, Sing-Pin, Hu, Yao Zhi, Devine, Daniel J
Year of Publication 12.07.2011
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Year of Publication 12.07.2011
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Selective reflectivity process chamber with customized wavelength response and method
Timans, Paul J, Devine, Daniel J, Lee, Young Jai, Hu, Yao Zhi, Bordiga, Peter C
Year of Publication 03.10.2006
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Year of Publication 03.10.2006
Patent
Device and method for thermally treating semiconductor wafers
Roters, Georg, Frigge, Steffen, Tay, Sing Pin, Hu, Yao Zhi, Hayn, Regina, Sachse, Jens-Uwe, Schoer, Erwin, Kegel, Wilhelm
Year of Publication 19.12.2006
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Year of Publication 19.12.2006
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Vorrichtung und verfahren zum thermischen behandeln von halbleiterwafern
STEFFEN FRIGGE, WILHELM KEGEL, SING PIN TAY, GEORG ROTERS, YAO ZHI HU, REGINA HAYN, JENS UWE SACHSE, ERWIN SCHOER
Year of Publication 11.01.2010
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Year of Publication 11.01.2010
Patent