Impact of post-deposition-annealing on the electrical characteristics of HfOxNy gate dielectric on Ge substrate
Cheng, Chao-Ching, Chien, Chao-Hsin, Chen, Ching-Wei, Hsu, Shih-Lu, Yang, Ming-Yi, Huang, Chien-Chao, Yang, Fu-Liang, Chang, Chun-Yen
Published in Microelectronic engineering (01.06.2005)
Published in Microelectronic engineering (01.06.2005)
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Journal Article
Conference Proceeding
Effects of postdeposition annealing on the characteristics of HfOxNy, dielectrics on germanium and silicon substrates
Cheng, Chao-Ching, Chien, Chao-Hsin, Chen, Ching-Wei, Hsu, Shih-Lu, Yang, Chun-Hui, Chang, Chun-Yen
Published in Journal of the Electrochemical Society (01.01.2006)
Published in Journal of the Electrochemical Society (01.01.2006)
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Journal Article
Effects of Postdeposition Annealing on the Characteristics of HfO[sub x]N[sub y] Dielectrics on Germanium and Silicon Substrates
Cheng, Chao-Ching, Chien, Chao-Hsin, Chen, Ching-Wei, Hsu, Shih-Lu, Yang, Chun-Hui, Chang, Chun-Yen
Published in Journal of the Electrochemical Society (2006)
Published in Journal of the Electrochemical Society (2006)
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Journal Article
Low-Temperature Growth of Polycrystalline Ge Films on SiO2 Substrate by HDPCVD
Yang, M.-J., Shieh, J., Hsu, S.-L., Huang, I.-J., Leu, C.-C., Shen, S.-W., Huang, T.-Y., Lehnen, P., Chien, C.-H.
Published in Electrochemical and solid-state letters (01.01.2005)
Published in Electrochemical and solid-state letters (01.01.2005)
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Journal Article
Reliability of Strained SiGe Channel p-Channel Metal–Oxide–Semiconductor Field-Effect Transistors with Ultra-Thin (EOT=3.1 nm) N 2 O-Annealed SiN Gate Dielectric
Chen, Ching-Wei, Chien, Chao-Hsin, Chen, Yi-Cheng, Hsu, Shih-Lu, Chang, Chun-Yen
Published in Japanese Journal of Applied Physics (01.06.2005)
Published in Japanese Journal of Applied Physics (01.06.2005)
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Journal Article
Deep Sub-Micron Strained Si 0.85 Ge 0.15 Channel p-channel Metal-Oxide-Semiconductor Field-Effect Transistors (pMOSFETs) with Ultra-Thin N 2 O-Annealed SiN Gate Dielectric
Chen, Ching-Wei, Chien, Chao-Hsin, Chen, Yi-Cheng, Hsu, Shih-Lu, Chang, Chun-Yen
Published in Japanese Journal of Applied Physics (01.02.2005)
Published in Japanese Journal of Applied Physics (01.02.2005)
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Journal Article