Threshold voltage tuning by metal gate work function modulation for 10 nm CMOS integration and beyond
Yoshida, Naomi, Keping Han, Peng-Fu Hsu, Beach, Matthew, Xinliang Lu, Hung, Raymond, Mao, Daxin, Hao Chen, Wei Tang, Yu Lei, Jing Zhou, Noori, Atif, Miao Jin, Kun Xu, Phatak, Anup, Shiyu Sun, Hassan, Sajjad, Gandikota, Srinivas, Chorng-Ping Chang, Brand, Adam
Published in Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) (01.04.2014)
Published in Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) (01.04.2014)
Get full text
Conference Proceeding
METHODS FOR FORMING A DOPED METAL CARBIDE FILM ON A SUBSTRATE AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
JOHNSON WARD, RAISANEN PETRI, HSU PENG FU, LI DONG, CHEN XICHONG, MOUSA MOATAZ BELLAH
Year of Publication 20.11.2019
Get full text
Year of Publication 20.11.2019
Patent
Synthesis and Characterization of Allyl(β-ketoiminato)palladium(II) Complexes: New Precursors for Chemical Vapor Deposition of Palladium Thin Films
Tung, Yeng-Lien, Tseng, Wen-Cheng, Lee, Chi-Young, Hsu, Peng-Fu, Chi, Yun, Peng, Shie-Ming, Lee, Gene-Hsiang
Published in Organometallics (01.03.1999)
Published in Organometallics (01.03.1999)
Get full text
Journal Article
Organometallic Ruthenium Source Reagents for CVD
Lee, F.-J., Chi, Y., Liu, C.-S., Hsu, P.-F., Chou, T.-Y., Peng, S.-M., Lee, G.-H.
Published in Chemical vapor deposition (01.05.2001)
Published in Chemical vapor deposition (01.05.2001)
Get full text
Journal Article
Metal gate work function modulation by ion implantation for multiple threshold voltage FinFET devices
Keping Han, Peng-Fu Hsu, Beach, Matthew, Henry, Todd, Yoshida, Naomi, Brand, Adam
Published in 2013 13th International Workshop on Junction Technology (IWJT) (01.06.2013)
Published in 2013 13th International Workshop on Junction Technology (IWJT) (01.06.2013)
Get full text
Conference Proceeding