SILICON WAFER AND EPITAXIAL SILICON WAFER
NONAKA NAOYA, NARUSHIMA YASUTO, ONO TOSHIAKI, HORAI MASATAKA, KOGA KOTARO
Year of Publication 21.03.2024
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Year of Publication 21.03.2024
Patent
SILICON WAFER AND EPITAXIAL SILICON WAFER
NONAKA NAOYA, NARUSHIMA YASUTO, ONO TOSHIAKI, HORAI MASATAKA, KOGA KOTARO
Year of Publication 18.05.2023
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Year of Publication 18.05.2023
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Comparison of gettering techniques by means of intentional quantitative Cu contamination
SANO, M, HORAI, M, MIYAZAKI, M, FUJINO, N, SHIRAIWA, T
Published in Japanese Journal of Applied Physics (01.07.1988)
Published in Japanese Journal of Applied Physics (01.07.1988)
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HIGH-RESISTANCE SILICON WAFER AND PROCESS FOR PRODUCING THE SAME
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Year of Publication 22.01.2004
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Silicon wafer and epitaxial silicon wafer
NONAKA NAOYA, NARUSHIMA YASUHITO, ONO TOSHIAKI, HORAI MASATAKA, KOGA KOTARO
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Year of Publication 05.05.2023
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A METHOD OF MANUFACTURING A HIGH-RESISTANCE SILICON WAFER
TAKAO, HIROYUKI, TAKASE, NOBUMITSU, SUEOKA, KOUJI, HORAI, MASATAKA, SADAMITSU, SHINSUKE
Year of Publication 05.10.2016
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Year of Publication 05.10.2016
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