Eigenanalysis of morphological diversity in silicon random nanostructures formed via resist collapse
Naruse, Makoto, Hoga, Morihisa, Ohyagi, Yasuyuki, Nishio, Shumpei, Tate, Naoya, Yoshida, Naoki, Matsumoto, Tsutomu
Published in Physica A (15.11.2016)
Published in Physica A (15.11.2016)
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Journal Article
Optical nano artifact metrics using silicon random nanostructures
Matsumoto, Tsutomu, Yoshida, Naoki, Nishio, Shumpei, Hoga, Morihisa, Ohyagi, Yasuyuki, Tate, Naoya, Naruse, Makoto
Published in Scientific reports (31.08.2016)
Published in Scientific reports (31.08.2016)
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Journal Article
Nano-artifact metrics based on random collapse of resist
Matsumoto, Tsutomu, Hoga, Morihisa, Ohyagi, Yasuyuki, Ishikawa, Mikio, Naruse, Makoto, Hanaki, Kenta, Suzuki, Ryosuke, Sekiguchi, Daiki, Tate, Naoya, Ohtsu, Motoichi
Published in Scientific reports (21.08.2014)
Published in Scientific reports (21.08.2014)
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Journal Article
Non-scanning optical near-field microscopy for nanophotonic security
Tate, Naoya, Naruse, Makoto, Matsumoto, Tsutomu, Hoga, Morihisa, Ohyagi, Yasuyuki, Nishio, Shumpei, Nomura, Wataru, Ohtsu, Motoichi
Published in Applied physics. A, Materials science & processing (01.12.2015)
Published in Applied physics. A, Materials science & processing (01.12.2015)
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Journal Article
Optical near-field-mediated polarization asymmetry induced by two-layer nanostructures
Naruse, Makoto, Tate, Naoya, Ohyagi, Yasuyuki, Hoga, Morihisa, Matsumoto, Tsutomu, Hori, Hirokazu, Drezet, Aurélien, Huant, Serge, Ohtsu, Motoichi
Published in Optics express (23.09.2013)
Published in Optics express (23.09.2013)
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Journal Article
Nanophotonic code embedded in embossed hologram for hierarchical information retrieval
Tate, Naoya, Naruse, Makoto, Yatsui, Takashi, Kawazoe, Tadashi, Hoga, Morihisa, Ohyagi, Yasuyuki, Fukuyama, Tokuhiro, Kitamura, Mitsuru, Ohtsu, Motoichi
Published in Optics express (29.03.2010)
Published in Optics express (29.03.2010)
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Journal Article
Demonstration of modulatable optical near-field interactions between dispersed resonant quantum dots
Tate, Naoya, Naruse, Makoto, Nomura, Wataru, Kawazoe, Tadashi, Yatsui, Takashi, Hoga, Morihisa, Ohyagi, Yasuyuki, Sekine, Yoko, Fujita, Hiroshi, Ohtsu, Motoichi
Published in Optics express (12.09.2011)
Published in Optics express (12.09.2011)
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Journal Article
Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process
Hoga, Morihisa, Itoh, Kimio, Ishikawa, Mikio, Kuwahara, Naoko, Fukuda, Masaharu, Toyama, Nobuhito, Kurokawa, Syuhei, Doi, Toshiro
Published in Microelectronic engineering (01.08.2011)
Published in Microelectronic engineering (01.08.2011)
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Conference Proceeding
Fabrication and characterization of a nano-convex-embedded Si MOSFET for nano-scale electrical discrimination
Mizuno, Shintaro, Lu, Renpeng, Shimizu, Katsumi, Ueba, Yosuke, Ishikawa, Mikio, Kitamura, Mitsuru, Hoga, Morihisa, Kasai, Seiya
Published in Japanese Journal of Applied Physics (01.06.2021)
Published in Japanese Journal of Applied Physics (01.06.2021)
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Journal Article
Stitching error analysis in an electron beam lithography system : column vibration effect
OHTA, H, MATSUZAKA, T, SAITOU, N, KAWASAKI, K, KOHNO, T, HOGA, M
Published in JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP (01.12.1993)
Published in JPN J APPL PHYS PART 1 REGUL PAP SHORT NOTE REV PAP (01.12.1993)
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Conference Proceeding
Journal Article
Error Analysis in Electron Beam Lithography System -Thermal Effects on Positioning Accuracy
Ohta, Hiroya, Matsuzaka, Takashi, Saitou, Norio, Kawasaki, Katsuhiro, Nakamura, Kazumitsu, Kohno, Toshihiko, Hoga, Morihisa
Published in Japanese Journal of Applied Physics (01.12.1992)
Published in Japanese Journal of Applied Physics (01.12.1992)
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Journal Article
The requirements for future electron-beam reticle fabrication systems from an error analysis viewpoint
MATSUZAKA, T, OHTA, H, SAITOU, N, KAWASAKI, K, KOHNO, T, HOGA, M
Published in Japanese Journal of Applied Physics (01.12.1993)
Published in Japanese Journal of Applied Physics (01.12.1993)
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Conference Proceeding
Journal Article
3D structural templates for UV-NIL fabricated with gray-scale lithography
Kurihara, Masaaki, Abe, Makoto, Suzuki, Katsutoshi, Yoshida, Kouji, Shimomura, Takeya, Hoga, Morihisa, Mohri, Hiroshi, Hayashi, Naoya
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Conference Proceeding