The dynamics of bubblers as vapor delivery systems
Love, Allen, Middleman, Stanley, Hochberg, Arthur K.
Published in Journal of crystal growth (02.03.1993)
Published in Journal of crystal growth (02.03.1993)
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Journal Article
The origin of nonuniform growth of LPCVD films from silane gas mixtures
YECKEL, A, MIDDLEMAN, S, HOCHBERG, A. K
Published in Journal of the Electrochemical Society (01.07.1989)
Published in Journal of the Electrochemical Society (01.07.1989)
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Journal Article
Cyclic alkylsilanes as low-pressure chemical vapor deposition silicon dioxide precursors
Laxman, Ravi Kumar, Hochberg, Arthur K., Cheng, Hansong, Roberts, David A.
Published in Thin solid films (01.07.1995)
Published in Thin solid films (01.07.1995)
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Journal Article
Precursors for depositing silicon-containing films and processes thereof
LAGENDIJK ANDRE, DEIS LISA A, HOCHBERG ARTHUR K, DEIS THOMAS A, CUTHILL KIRK S
Year of Publication 18.08.2005
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Year of Publication 18.08.2005
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