High-Quality SiO 2 /Si Interface Formation and Its Application to Fabrication of Low-Temperature-Processed Polycrystalline Si Thin-Film Transistor
Higashi, Seiichiro, Abe, Daisuke, Hiroshima, Yasushi, Miyashita, Kazuyuki, Kawamura, Takahiro, Inoue, Satoshi, Shimoda, Tatsuya
Published in Japanese Journal of Applied Physics (15.06.2002)
Published in Japanese Journal of Applied Physics (15.06.2002)
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Journal Article
Development of high-performance polycrystalline silicon thin-film transistors (TFTs) using defect control process technologies
Higashi, S., Abe, D., Hiroshima, Y., Miyashita, K., Kawamura, T., Inoue, S., Shimoda, T.
Published in IEEE electron device letters (01.07.2002)
Published in IEEE electron device letters (01.07.2002)
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Journal Article