Study on fabrication of conductive antimony doped tin oxide thin films (SnOx:Sb) by 3rd generation mist chemical vapor deposition
Liu, Li, Kawaharamura, Toshiyuki, Dang, Giang Thai, Pradeep, Ellawala K. C., Sato, Shota, Uchida, Takayuki, Fujita, Shizuo, Hiramatsu, Takahiro, Kobayashi, Hiroshi, Orita, Hiroyuki
Published in Japanese Journal of Applied Physics (01.02.2019)
Published in Japanese Journal of Applied Physics (01.02.2019)
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Journal Article
Stereoselective synthesis of the right-hand segment of tubiferal A
Hiramatsu, Takahiro, Takahashi, Motomasa, Tanino, Keiji
Published in Tetrahedron letters (05.02.2014)
Published in Tetrahedron letters (05.02.2014)
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Journal Article
Mist chemical vapor deposition of aluminum oxide thin films for rear surface passivation of crystalline silicon solar cells
Uchida, Takayuki, Kawaharamura, Toshiyuki, Shibayama, Kenji, Hiramatsu, Takahiro, Orita, Hiroyuki, Fujita, Shizuo
Published in Applied physics express (01.02.2014)
Published in Applied physics express (01.02.2014)
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Journal Article
Extraction of Trap Densities in ZnO Thin-Film Transistors and Dependence on Oxygen Partial Pressure During Sputtering of ZnO Films
Kimura, M., Furuta, M., Kamada, Y., Hiramatsu, T., Matsuda, T., Furuta, H., Li, C., Fujita, S., Hirao, T.
Published in IEEE transactions on electron devices (01.09.2011)
Published in IEEE transactions on electron devices (01.09.2011)
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Journal Article
Study on oxygen source and its effect on film properties of ZnO deposited by radio frequency magnetron sputtering
Kamada, Yudai, Furuta, Mamoru, Hiramatsu, Takahiro, Kawaharamura, Toshiyuki, Wang, Dapeng, Shimakawa, Shin-ichi, Li, Chaoyang, Fujita, Shizuo, Hirao, Takashi
Published in Applied surface science (01.11.2011)
Published in Applied surface science (01.11.2011)
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Journal Article
Photo-Leakage Current of Zinc Oxide Thin-Film Transistors
Kamada, Yudai, Fujita, Shizuo, Hiramatsu, Takahiro, Matsuda, Tokiyoshi, Nitta, Hiroshi, Furuta, Mamoru, Hirao, Takashi
Published in Japanese Journal of Applied Physics (01.03.2010)
Published in Japanese Journal of Applied Physics (01.03.2010)
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Journal Article
Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias
Furuta, Mamoru, Hiramatsu, Takahiro, Hirao, Takashi
Published in Japanese Journal of Applied Physics (01.05.2010)
Published in Japanese Journal of Applied Physics (01.05.2010)
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