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Mirror, in particular for a microlithographic projection exposure apparatus
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Year of Publication 23.12.2021
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Year of Publication 11.03.2021
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Year of Publication 04.03.2021
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Year of Publication 04.03.2021
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OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION AGAINST THE ETCHING EFFECT OF A PLASMA
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Year of Publication 07.02.2019
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Year of Publication 07.02.2019
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Optische Anordnung für EUV-Strahlung mit einer Abschirmung zum Schutz vor der Ätzwirkung eines Plasmas
Haas, Simon, Becker, Moritz, Liebaug, Björn, Hild, Kerstin, Hartjes, Joachim
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Year of Publication 31.01.2019
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MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM
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Year of Publication 10.04.2020
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Year of Publication 10.04.2020
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MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM
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Year of Publication 14.02.2019
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Year of Publication 14.02.2019
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Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
van Eerd, Ben Wylie, Schulte, Stefan, Gruner, Toralf, Bijkerk, Frederik, Hild, Kerstin, Weyler, Simone
Year of Publication 14.02.2019
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Year of Publication 14.02.2019
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