Search Results - "HIGASHITANI KEIICHI" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

by HIGASHITANI, KEIICHI, KIMURA, MASATOSHI, OHNO, TAKIO
Year of Publication 01.12.2000

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Patent

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

by OKADA MASAKAZU, HIGASHITANI KEIICHI
Year of Publication 13.05.2010

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Patent

A wafer level monitoring method for plasma-charging damage using antenna PMOSFET test structure

A wafer level monitoring method for plasma-charging damage using antenna PMOSFET test structure

by Watanabe, H., Komori, J., Higashitani, K., Sekine, M., Koyama, H.
Published in IEEE transactions on semiconductor manufacturing (01.05.1997)

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Journal Article Conference Proceeding

A 2 V 250 MHz multimedia processor

A 2 V 250 MHz multimedia processor

by Yoshida, T., Shimazu, Y., Yamada, A., Holmann, E., Nakakimura, K., Takata, H., Kitao, M., Kishi, T., Kobayashi, H., Sato, M., Mohri, A., Suzuki, K., Ajioka, Y., Higashitani, K.
Published in 1997 IEEE International Solids-State Circuits Conference. Digest of Technical Papers (01.01.1997)

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Conference Proceeding Journal Article

Semiconductor device with self-aligned contact structure

Semiconductor device with self-aligned contact structure

by Yoshiyama, Kenji, Higashitani, Keiichi
Year of Publication 12.11.2002

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Patent

Semiconductor device with self-aligned contact structure

Semiconductor device with self-aligned contact structure

by YOSHIYAMA KENJI, HIGASHITANI KEIICHI
Year of Publication 12.11.2002

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Patent

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method thereof

by YOSHIYAMA, KENJI, HIGASHITANI, KEIICHI
Year of Publication 21.06.2002

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Patent

Semiconductor device and method of manufacturing the same

Semiconductor device and method of manufacturing the same

by HIGASHITANI, KEIICHI, OKADA, MASAKAZU
Year of Publication 11.07.2001

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Patent

Semiconductor device provided with a field-effect transistor and method of manufacturing the same

Semiconductor device provided with a field-effect transistor and method of manufacturing the same

by OKADA MASAKAZU, HIGASHITANI KEIICHI
Year of Publication 15.05.2001

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Patent

Semiconductor device and method of manufacturing semiconductor device

Semiconductor device and method of manufacturing semiconductor device

by HARADA; AKIHIKO, HIGASHITANI; KEIICHI
Year of Publication 21.03.2000

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Patent

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

by IGARASHI MOTOSHIGE, KAWASHIMA HIROSHI, HIGASHITANI KEIICHI
Year of Publication 26.05.2005

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Patent

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

by Kawashima, Hiroshi, Igarashi, Motoshige, Higashitani, Keiichi
Year of Publication 11.01.2005

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Patent

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

by IGARASHI MOTOSHIGE, KAWASHIMA HIROSHI, HIGASHITANI KEIICHI
Year of Publication 11.01.2005

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Patent

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

by IGARASHI MOTOSHIGE, KAWASHIMA HIROSHI, HIGASHITANI KEIICHI
Year of Publication 20.11.2003

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Patent

Method of manufacturing semiconductor device

Method of manufacturing semiconductor device

by Igarashi, Motoshige, Kawashima, Hiroshi, Higashitani, Keiichi
Year of Publication 20.11.2003

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Patent

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE OF DUAL-GATE CONSTRUCTION, AND SEMICONDUCTOR DEVICE MANUFACTURED THEREBY INCLUDING FORMING A REGION OF OVER-LAPPING N-TYPE AND P-TYPE IMPURITIES WITH LOWER RESISTANCE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE OF DUAL-GATE CONSTRUCTION, AND SEMICONDUCTOR DEVICE MANUFACTURED THEREBY INCLUDING FORMING A REGION OF OVER-LAPPING N-TYPE AND P-TYPE IMPURITIES WITH LOWER RESISTANCE

by YOSHIYAMA KENJI, SUGIYAMA MASAO, HIGASHITANI KEIICHI
Year of Publication 16.09.2003

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Patent

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE OF DUAL-GATE CONSTRUCTION, AND SEMICONDUCTOR DEVICE MANUFACTURED THEREBY INCLUDING FORMING A REGION OF OVER-LAPPING N-TYPE AND P-TYPE IMPURITIES WITH LOWER RESISTANCE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE OF DUAL-GATE CONSTRUCTION, AND SEMICONDUCTOR DEVICE MANUFACTURED THEREBY INCLUDING FORMING A REGION OF OVER-LAPPING N-TYPE AND P-TYPE IMPURITIES WITH LOWER RESISTANCE

by Yoshiyama, Kenji, Higashitani, Keiichi, Sugiyama, Masao
Year of Publication 16.09.2003

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Patent

Semiconductor device having an improved interlayer contact and manufacturing method thereof

Semiconductor device having an improved interlayer contact and manufacturing method thereof

by Okada, Masakazu, Higashitani, Keiichi, Kawashima, Hiroshi
Year of Publication 11.03.2003

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Patent

Semiconductor device having an improved interlayer contact and manufacturing method thereof

Semiconductor device having an improved interlayer contact and manufacturing method thereof

by OKADA MASAKAZU, KAWASHIMA HIROSHI, HIGASHITANI KEIICHI
Year of Publication 11.03.2003

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Patent

Method of fabricating a semiconductor device

Method of fabricating a semiconductor device

by AMISHIRO HIROYUKI, HIGASHITANI KEIICHI, HARUHANA HIDEYO
Year of Publication 05.12.2002

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Patent