Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si₂Cl₆ and NH₃ Plasma
Ovanesyan, Rafaiel A, Hausmann, Dennis M, Agarwal, Sumit
Published in ACS applied materials & interfaces (27.05.2015)
Published in ACS applied materials & interfaces (27.05.2015)
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Journal Article
Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
Faraz, Tahsin, Knoops, Harm C. M, Verheijen, Marcel A, van Helvoirt, Cristian A. A, Karwal, Saurabh, Sharma, Akhil, Beladiya, Vivek, Szeghalmi, Adriana, Hausmann, Dennis M, Henri, Jon, Creatore, Mariadriana, Kessels, Wilhelmus M. M
Published in ACS applied materials & interfaces (18.04.2018)
Published in ACS applied materials & interfaces (18.04.2018)
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Journal Article
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
Hausmann, Dennis M, Kim, Esther, Becker, Jill, Gordon, Roy G
Published in Chemistry of materials (01.10.2002)
Published in Chemistry of materials (01.10.2002)
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Journal Article
Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook
Ovanesyan, Rafaiel A., Filatova, Ekaterina A., Elliott, Simon D., Hausmann, Dennis M., Smith, David C., Agarwal, Sumit
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.11.2019)
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01.11.2019)
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Book Review
Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition
Liu, Tzu-Ling, Zeng, Li, Nardi, Katie L, Hausmann, Dennis M, Bent, Stacey F
Published in Langmuir (05.10.2021)
Published in Langmuir (05.10.2021)
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Journal Article
Extending growth inhibition during area-selective atomic layer deposition of Al2O3 on aminosilane-functionalized SiO2
Xu, Wanxing, Lemaire, Paul C, Sharma, Kashish, Hausmann, Dennis M, Agarwal, Sumit
Published in Chemical communications (Cambridge, England) (08.06.2022)
Published in Chemical communications (Cambridge, England) (08.06.2022)
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Journal Article
Extending growth inhibition during area-selective atomic layer deposition of Al 2 O 3 on aminosilane-functionalized SiO 2
Xu, Wanxing, Lemaire, Paul C, Sharma, Kashish, Hausmann, Dennis M, Agarwal, Sumit
Published in Chemical communications (Cambridge, England) (08.06.2022)
Published in Chemical communications (Cambridge, England) (08.06.2022)
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Journal Article
Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition
Liu, Tzu-Ling, Nardi, Katie L, Draeger, Nerissa, Hausmann, Dennis M, Bent, Stacey F
Published in ACS applied materials & interfaces (16.09.2020)
Published in ACS applied materials & interfaces (16.09.2020)
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Journal Article
Mechanism of Precursor Blocking by Acetylacetone Inhibitor Molecules during Area-Selective Atomic Layer Deposition of SiO2
Merkx, Marc J. M, Sandoval, Tania E, Hausmann, Dennis M, Kessels, Wilhelmus M. M, Mackus, Adriaan J. M
Published in Chemistry of materials (28.04.2020)
Published in Chemistry of materials (28.04.2020)
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Journal Article
Formation and Ripening of Self-Assembled Multilayers from the Vapor-Phase Deposition of Dodecanethiol on Copper Oxide
Bergsman, David S, Liu, Tzu-Ling, Closser, Richard G, Nardi, Katie L, Draeger, Nerissa, Hausmann, Dennis M, Bent, Stacey F
Published in Chemistry of materials (28.08.2018)
Published in Chemistry of materials (28.08.2018)
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Journal Article
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
Merkx, Marc J. M, Angelidis, Athanasios, Mameli, Alfredo, Li, Jun, Lemaire, Paul C, Sharma, Kashish, Hausmann, Dennis M, Kessels, Wilhelmus M. M, Sandoval, Tania E, Mackus, Adriaan J. M
Published in Journal of physical chemistry. C (17.03.2022)
Published in Journal of physical chemistry. C (17.03.2022)
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Journal Article
Gas Phase Organic Functionalization of SiO2 with Propanoyl Chloride
Gasvoda, Ryan J, Wang, Scott, Hausmann, Dennis M, Hudson, Eric A, Agarwal, Sumit
Published in Langmuir (04.12.2018)
Published in Langmuir (04.12.2018)
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Journal Article
Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N 2 Plasma on Planar and 3D Substrate Topographies
Faraz, Tahsin, van Drunen, Maarten, Knoops, Harm C M, Mallikarjunan, Anupama, Buchanan, Iain, Hausmann, Dennis M, Henri, Jon, Kessels, Wilhelmus M M
Published in ACS applied materials & interfaces (18.01.2017)
Published in ACS applied materials & interfaces (18.01.2017)
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Journal Article
Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies
Faraz, Tahsin, van Drunen, Maarten, Knoops, Harm C. M, Mallikarjunan, Anupama, Buchanan, Iain, Hausmann, Dennis M, Henri, Jon, Kessels, Wilhelmus M. M
Published in ACS applied materials & interfaces (18.01.2017)
Published in ACS applied materials & interfaces (18.01.2017)
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Journal Article