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Year of Publication 17.05.2018
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Year of Publication 22.01.2019
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Selective inhibition in atomic layer deposition of silicon-containing films
Henri Jon, Tang Shane, van Schravendijk Bart J, Hausmann Dennis M, Leeser Karl F
Year of Publication 23.01.2018
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Year of Publication 23.01.2018
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Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)
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Year of Publication 24.12.2019
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Year of Publication 24.12.2019
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Deposition of aluminum oxide etch stop layers
Rainville Meliha Gozde, Reddy Kapu Sirish, Shankar Nagraj, Hausmann Dennis M
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Year of Publication 02.01.2018
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SELECTIVE DEPOSITION WITH ATOMIC LAYER ETCH RESET
RAINVILLE, Meliha Gozde, PORTER, David W, SHANKAR, Nagraj, REDDY, Kapu Sirish, HAUSMANN, Dennis M, SMITH, David Charles, SIVARAMAKRISHNAN, Karthik
Year of Publication 29.11.2018
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Year of Publication 29.11.2018
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SELECTIVE DEPOSITION WITH ATOMIC LAYER ETCH RESET
Sivaramakrishnan, Karthik, Hausmann, Dennis M, Smith, David Charles, Reddy, Kapu Sirish, Rainville, Meliha Gozde, Shankar, Nagraj, Porter, David W
Year of Publication 25.10.2018
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Year of Publication 25.10.2018
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DEPOSITION OF ALUMINA LAYERS
REDDY, KAPUR, SRISH, RAINVILLE MELIHA GOZDE, SHANKAR NAGRAJ, HAUSMANN DENNIS M
Year of Publication 03.06.2022
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Year of Publication 03.06.2022
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