Search Results - "HATA MITSUHIRO" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

A Strictly “Pair”-Selective Synthesis of Conjugated Diynes via Pd-Catalyzed Cross Coupling of 1,3-Diynylzincs: A Superior Alternative to the Cadiot−Chodkiewicz Reaction

A Strictly “Pair”-Selective Synthesis of Conjugated Diynes via Pd-Catalyzed Cross Coupling of 1,3-Diynylzincs: A Superior Alternative to the Cadiot−Chodkiewicz Reaction

by Negishi, Ei-ichi, Hata, Mitsuhiro, Xu, Caiding
Published in Organic letters (16.11.2000)

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Journal Article

Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography

Novel Top-coat Materials Containing a Bulky Silicon Group for ArF Immersion Lithography

by Hata, Mitsuhiro, Ryoo, Man-Hyoung, Choi, Sang-Jun, Cho, Han-Ku
Published in Journal of Photopolymer Science and Technology (01.01.2006)

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Journal Article

Dissolution Enhancement of Immersion Barrier Coat by Post Exposure Bake

Dissolution Enhancement of Immersion Barrier Coat by Post Exposure Bake

by Hata, Mitsuhiro, Kim, Hyun-Woo, Yoon, Jin-Young, Ha, Jung-Hwan, Ryoo, Man-Hyoung, Woo, Sang-Gyun, Cho, Han-Ku
Published in Journal of Photopolymer Science and Technology (01.01.2005)

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Journal Article

Most Efficient Alternative Manner of Patterning sub-80 nm Contact Holes and Trenches with 193 nm Lithography

Most Efficient Alternative Manner of Patterning sub-80 nm Contact Holes and Trenches with 193 nm Lithography

by Hah, Jung Hwan, Yoon, Jin-Young, Hata, Mitsuhiro, Kim, Sang Wook, Kim, Hyun-Woo, Woo, Sang-Gyoun, Cho, Han-Ku, Han, Woo-Sung, Moon, Joo-Tae, Ryu, Byoung-Il
Published in Japanese Journal of Applied Physics (01.06.2004)

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Journal Article

PROCESS FOR PRODUCING PHOTORESIST PATTERN

PROCESS FOR PRODUCING PHOTORESIST PATTERN

by HASHIMOTO KAZUHIKO, HATA MITSUHIRO
Year of Publication 27.04.2011

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Patent

PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

by MASUYAMA TATSURO, HATA MITSUHIRO
Year of Publication 23.03.2011

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Patent

PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

by MASUYAMA TATSURO, HATA MITSUHIRO
Year of Publication 23.03.2011

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Patent

PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

by MASUYAMA TATSURO, HATA MITSUHIRO
Year of Publication 17.02.2011

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Patent

COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME

COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME

by MASUYAMA TATSURO, HATA MITSUHIRO
Year of Publication 17.02.2011

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Patent

PROCESS FOR PRODUCING PHOTORESIST PATTERN

PROCESS FOR PRODUCING PHOTORESIST PATTERN

by KAMABUCHI AKIRA, HATA MITSUHIRO
Year of Publication 02.11.2010

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Patent

PROCESS FOR PRODUCING PHOTORESIST PATTERN

PROCESS FOR PRODUCING PHOTORESIST PATTERN

by HAH, JUNG HWAN, HATA MITSUHIRO
Year of Publication 13.07.2011

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Patent

PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

by ICHIKAWA KOJI, HATA MITSUHIRO, YASUE TAKAHIRO
Year of Publication 08.02.2012

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Patent

RESIST PROCESSING METHOD AND USE OF POSITIVE RESIST COMPOSITION

RESIST PROCESSING METHOD AND USE OF POSITIVE RESIST COMPOSITION

by HASHIMOTO KAZUHIKO, HATA MITSUHIRO, YAMAMOTO SATOSHI
Year of Publication 03.06.2011

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Patent

PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

by ICHIKAWA KOJI, MIYAGAWA TAKAYUKI, HATA MITSUHIRO
Year of Publication 01.06.2011

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Patent

METHOD OF RESIST TREATMENT

METHOD OF RESIST TREATMENT

by MIYAGAWA TAKAYUKI, HATA MITSUHIRO, YAMAMOTO SATOSHI
Year of Publication 04.04.2011

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Patent

METHOD OF RESIST TREATMENT

METHOD OF RESIST TREATMENT

by SHIGEMATSU JUNJI, HATA MITSUHIRO, HIRAOKA TAKASHI
Year of Publication 23.02.2011

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Patent

PROCESS FOR PRODUCING PHOTORESIST PATTERN

PROCESS FOR PRODUCING PHOTORESIST PATTERN

by FUJI YUSUKE, HATA MITSUHIRO, YAMAMOTO SATOSHI
Year of Publication 02.11.2010

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Patent

RESIST PROCESSING METHOD AND USE OF POSITIVE RESIST COMPOSITION

RESIST PROCESSING METHOD AND USE OF POSITIVE RESIST COMPOSITION

by YAMAMOTO, SATOSHI, HASHIMOTO, KAZUHIKO, HATA, MITSUHIRO
Year of Publication 18.03.2010

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Patent

COMPOUND, METHOD FOR PRODUCING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND

COMPOUND, METHOD FOR PRODUCING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND

by TAKEMOTO ICHIKI, ANDO NOBUO, HATA MITSUHIRO
Year of Publication 11.03.2010

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Patent

METHOD OF RESIST TREATMENT

METHOD OF RESIST TREATMENT

by HATA, MITSUHIRO, MIYAGAWA, TAKAYUKI, YAMAMOTO, SATOSHI
Year of Publication 14.01.2010

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Patent

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