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LEVY KARL B, ASHTIANI KAIHAN A, HARTSOUGH LARRY D, NORDQUIST ANDREW L, LAI KWOK F
Year of Publication 24.12.2002
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Year of Publication 24.12.2002
Patent
Apparatus and method for controlling plasma uniformity across a substrate
Ashtiani, Kaihan A, Levy, Karl B, Lai, Kwok F, Nordquist, Andrew L, Hartsough, Larry D
Year of Publication 24.12.2002
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Year of Publication 24.12.2002
Patent
Physical vapor deposition reactor including magnet to control flow of ions
LEVY KARL B, ASHTIANI KAIHAN A, HARTSOUGH LARRY D, NORDQUIST ANDREW L, LAI KWOK F
Year of Publication 03.09.2002
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Year of Publication 03.09.2002
Patent
Physical vapor deposition reactor including magnet to control flow of ions
Lai, Kwok F, Nordquist, Andrew L, Ashtiani, Kaihan A, Hartsough, Larry D, Levy, Karl B
Year of Publication 03.09.2002
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Year of Publication 03.09.2002
Patent
Apparatus and method for controlling plasma uniformity across a substrate
LEVY KARL B, ASHTIANI KAIHAN A, HARTSOUGH LARRY D, NORDQUIST ANDREW L, LAI KWOK F
Year of Publication 30.01.2001
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Year of Publication 30.01.2001
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Internally cooled target assembly for magnetron sputtering
COCHRAN; RONALD R, JIANG; MINGWEI, HARRA; DAVID J, HARTSOUGH; LARRY D
Year of Publication 16.11.1999
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Year of Publication 16.11.1999
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