Search Results - "HANAWA HIROJI" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR

ROTATABLE SUBSTRATE SUPPORT HAVING RADIO FREQUENCY APPLICATOR

by KOBAYASHI SATORU, LUBOMIRSKY DMITRY, FLOYD KIRBY HANE, PARK SOONAM, HANAWA HIROJI
Year of Publication 26.03.2015

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Patent

Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication

Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semiconductor fabrication

by HANAWA; HIROJI
Year of Publication 12.09.1995

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Patent

Methods of directing magnetic fields in a plasma source, and associated systems

Methods of directing magnetic fields in a plasma source, and associated systems

by HANAWA HIROJI, ROCHA-ALVAREZ JUAN CARLOS, PINSON, II JAY D, YE ZHENG JOHN
Year of Publication 05.04.2016

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Patent

Improved radiation heating efficiency by increasing optical absorption of a silicon containing material

Improved radiation heating efficiency by increasing optical absorption of a silicon containing material

by MAUNG, KYAWWIN JASON, HANAWA, HIROJI
Year of Publication 11.10.2014

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Patent

PROCESSING METHOD FOR WORKPIECE USING PLASMA, AND PROCESS REACTION EQUIPMENT INCLUDING PLASMA IGNITION DEVICE AND INDUCTIVE COUPLING DEVICE, FOR SEMICONDUCTOR PROCESSING

PROCESSING METHOD FOR WORKPIECE USING PLASMA, AND PROCESS REACTION EQUIPMENT INCLUDING PLASMA IGNITION DEVICE AND INDUCTIVE COUPLING DEVICE, FOR SEMICONDUCTOR PROCESSING

by HIROJI HANAWA
Year of Publication 21.07.1995

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Patent

Methods and apparatus for treating workpieces with plasmas

Methods and apparatus for treating workpieces with plasmas

by HANAWA, HIROJI
Year of Publication 26.04.1995

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Patent

CAPACITIVELY COUPLED PLASMA ETCH CHAMBER WITH MULTIPLE RF FEEDS

CAPACITIVELY COUPLED PLASMA ETCH CHAMBER WITH MULTIPLE RF FEEDS

by WONG LAWRENCE, KOBAYASHI SATURO, HANAWA HIROJI
Year of Publication 21.01.2010

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Patent

IN-SITU VHF VOLTAGE/CURRENT SENSORS FOR A PLASMA REACTOR

IN-SITU VHF VOLTAGE/CURRENT SENSORS FOR A PLASMA REACTOR

by KOBAYASHI SATORU, HANAWA HIROJI, RAMASWAMY KARTIK, RAUF SHAHID
Year of Publication 12.04.2012

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Patent

Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system

Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system

by Ramaswamy, Kartik, Hanawa, Hiroji, Wong, Lawrence, Dinh, Chinh
Year of Publication 03.04.2012

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Patent

Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system

Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system

by WONG LAWRENCE, DINH CHINH, RAMASWAMY KARTIK, HANAWA HIROJI
Year of Publication 03.04.2012

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Patent

METHODS OF DIRECTING MAGNETIC FIELDS IN A PLASMA SOURCE, AND ASSOCIATED SYSTEMS

METHODS OF DIRECTING MAGNETIC FIELDS IN A PLASMA SOURCE, AND ASSOCIATED SYSTEMS

by HANAWA HIROJI, ROCHA-ALVAREZ JUAN CARLOS, PINSON, II JAY D, YE ZHENG JOHN
Year of Publication 13.08.2015

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Patent

METHODS OF DIRECTING MAGNETIC FIELDS IN A PLASMA SOURCE, AND ASSOCIATED SYSTEMS

METHODS OF DIRECTING MAGNETIC FIELDS IN A PLASMA SOURCE, AND ASSOCIATED SYSTEMS

by ROCHA-ALVAREZ, JUAN CARLOS, HANAWA, HIROJI, YE, ZHENG JOHN, PINSON, JAY D., II
Year of Publication 13.08.2015

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Patent

Rotatable substrate support having radio frequency applicator

Rotatable substrate support having radio frequency applicator

by LUBOMIRSKY, DMITRY, KOBAYASHI, SATORU, FLOYD, KIRBY H, HANAWA, HIROJI, KENNEY, JASON A
Year of Publication 01.06.2019

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Patent

NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTED BY ATOMIC LAYER DEPOSITION

NOVEL METHOD FOR CONFORMAL PLASMA IMMERSED ION IMPLANTATION ASSISTED BY ATOMIC LAYER DEPOSITION

by CHO SEON-MEE, HANAWA HIROJI, FOAD MAJEED A
Year of Publication 30.06.2011

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Patent

Apparatus for VHF impedance match tuning

Apparatus for VHF impedance match tuning

by WONG LAWRENCE, RAMASWAMY KARTIK, HANAWA HIROJI, COLLINS KENNETH S, NGUYEN ANDREW, BANNA SAMER
Year of Publication 12.11.2013

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Patent

APPARATUS AND METHOD FOR HVPE PROCESSING USING A PLASMA

APPARATUS AND METHOD FOR HVPE PROCESSING USING A PLASMA

by GRIFFIN KEVIN S, OLGADO DONALD J.K, NGUYEN SON T, MELNIK YURIY, HANAWA HIROJI, BROWN KARL M
Year of Publication 11.04.2013

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Patent

FIELD ENDPOINT DETECTION FOR CHEMICAL MECHANICAL POLISHING, AND PROCESS MONITORING METHOD AND APPARATUS

FIELD ENDPOINT DETECTION FOR CHEMICAL MECHANICAL POLISHING, AND PROCESS MONITORING METHOD AND APPARATUS

by RAJEEV BAJAJ, MANOOCHER BIRANG, NILS JOHANSSON, FRITZ C REDEKER, HANAWA HIROJI, BOGUSLAW A SWEDEK
Year of Publication 28.03.2013

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Patent

METHOD AND APPARATUS FOR CLAMPING AND DECLAMPING SUBSTRATES USING ELECTROSTATIC CHUCKS

METHOD AND APPARATUS FOR CLAMPING AND DECLAMPING SUBSTRATES USING ELECTROSTATIC CHUCKS

by LEE, KWANGDUK DOUGLAS, PADHI, DEENESH, YE, ZHENG JOHN, WANG, WENJIAO, KIM, BOK HOEN, KULSHRESHTHA, PRASHANT KUMAR, MANNA, PRAMIT, TSIANG, MICHAEL WENYOUNG, LIN, YONGJING, ROCHA-ALVAREZ, JUAN CARLOS, HANAWA, HIROJI, HAN, XINHAI, NARASIMHA, KARTHIK THIMMAVAJJULA, DUAN, ZIQING, KO, ALLEN
Year of Publication 01.08.2022

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Patent

PLASMA ASSISTED HVPE CHAMBER DESIGN

PLASMA ASSISTED HVPE CHAMBER DESIGN

by GRIFFIN KEVIN S, OLGADO DONALD J.K, NGUYEN SON T, MELNIK YURIY, HANAWA HIROJI, BROWN KARL M
Year of Publication 07.02.2013

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Patent

Plasma reactor with uniform process rate distribution by improved RF ground return path

Plasma reactor with uniform process rate distribution by improved RF ground return path

by TODOROW VALENTIN N, SHEYNER ANCHEL, HANAWA HIROJI, RAMASWAMY KARTIK, NGUYEN ANDREW, BANNA SAMER
Year of Publication 29.01.2013

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Patent

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