RELATIONSHIP BETWEEN PATTERNING AND DISSOLUTION CHARACTARISTICS OF CHEMICAL AMPLIFICATION RESISTS USING PARTLY PROTECTED POLY(p-VINYLPHENOL)
KUMADA, TERUHIKO, KUBOTA, SHIGERU, KOEZUKA, HIROSHI, HANAWA, TETURO, KISHIMURA, SHINJI, NAGATA, HITOSHI
Published in Journal of Photopolymer Science and Technology (1991)
Published in Journal of Photopolymer Science and Technology (1991)
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