Characterization methodology to support process development of advanced patterning structures
Mishra, Shailendra, Vaid, Alok, Lin Zhou, Hyunchul Jung, Liping Cui, Luo Meng, Shi Yong Ju, Thaung-Htun Oo, Wen Pin Peng, Jesper, Yue Hu, Xuefeng Zeng, Han Taejoon, Bozdog, Cornel, Isbester, Paul, Cohen, Oded
Published in ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2013)
Published in ASMC 2013 SEMI Advanced Semiconductor Manufacturing Conference (01.05.2013)
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Conference Proceeding
Evidence that N 2O is a stronger oxidizing agent than O 2 for both Ta 2O 5 and bare Si below 1000 °C and temperature for minimum low- K interfacial oxide for high- K dielectric on Si
Lau, W.S., Qian, P.W., Han, Taejoon, Sandler, Nathan P., Che, S.T., Ang, S.E., Tung, C.H., Sheng, T.T.
Published in Microelectronics and reliability (2007)
Published in Microelectronics and reliability (2007)
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Journal Article
IN-SITU PHOTORESIST STRIP DURING PLASMA ETCHING OF ACTIVE HARD MASK
YEN BI MING, CHO, SANG JUN, KANG, SEAN S, HAN TAEJOON, GOPALADASU PRABHAKARA, CHOI TOM
Year of Publication 11.03.2010
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Year of Publication 11.03.2010
Patent
Evidence that N2O is a stronger oxidizing agent than O2 for both Ta2O5 and bare si below 1000 °C and temperature for minimum low-K interfacial oxide for high-K dielectric on Si
LAU, W. S, QIAN, P. W, HAN, Taejoon, SANDIER, Nathan P, CHE, S. T, ANG, S. E, TUNG, C. H, SHENG, T. T
Published in Microelectronics and reliability (01.02.2007)
Published in Microelectronics and reliability (01.02.2007)
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Journal Article
A Radar for Ultra-thin High-k Dielectric Film: Zero-Bias Thermally Stimulated Current Spectroscopy
Lau, Wai Shing, Han, Taejoon, Zhang, G. L., Qian, P. W., Leong, L. L., Che, S. T., Wong, Parry
Published in ECS transactions (07.07.2006)
Published in ECS transactions (07.07.2006)
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Journal Article