METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSILE STRESS AT ELEVATED TEMPERATURES IN A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM
ROCHA ALVAREZ JUAN CARLOS, KULSHRESHTHA PRASHANT KUMAR, PINSON JAY D. II, BALASUBRAMANIAN GANESH, ZHOU JIANHUA, PONNEKANTI HARI K, BEHERA SWAYAMBHU P, DUAN REN GUAN, LEE KWANGDUK DOUGLAS, FOSTER JASON K, HANAWA HIROJI, LIN XING, KIM BOK HOEN, HALLER UWE P, YE ZHENG JOHN, HA SUNGWON, SRINIVASAN MUKUND
Year of Publication 18.04.2017
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Year of Publication 18.04.2017
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Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system
Lin, Xing, Hanawa, Hiroji, Srinivasan, Mukund, Ponnekanti, Hari K, Ha, Sungwon, Lee, Kwangduk Douglas, Rocha-Alvarez, Juan Carlos, Foster, Jason K, Zhou, Jianhua, Pinson, II, Jay D, Duan, Ren-Guan, Balasubramanian, Ganesh, Haller, Uwe P, Behera, Swayambhu P, Kim, Bok Hoen, Kulshreshtha, Prashant Kumar, Ye, Zheng John
Year of Publication 03.09.2019
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Year of Publication 03.09.2019
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METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSILE STRESS AT ELEVATED TEMPERATURES IN A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM
KIM BOK-HOEN, KULSHRESHTHA PRASHANT KUMAR, PINSON JAY D. II, DUAN RENGUAN, BALASUBRAMANIAN GANESH, ROCHA-ALVAREZ JUAN CARLOS, ZHOU JIANHUA, PONNEKANTI HARI K, BEHERA SWAYAMBHU P, LEE KWANGDUK DOUGLAS, FOSTER JASON K, HANAWA HIROJI, LIN XING, HALLER UWE P, YE ZHENG JOHN, HA SUNGWON, SRINIVASAN MUKUND
Year of Publication 25.01.2022
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Year of Publication 25.01.2022
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