Search Results - "HAH JUNG HWAN" :: K.UTB vyhledávací portál

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RESIST COMPOSITION

by HAH JUNG-HWAN, YAMAGUCHI NORIFUMI
Year of Publication 06.09.2012

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RESIST COMPOSITION

by HAH JUNG-HWAN, YAMAGUCHI NORIFUMI
Year of Publication 06.09.2012

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One pot synthesis of mono- and spirocyclic α-phosphonato-α,β-unsaturated cycloenones

by Gil, Jun Mo, Hah, Jung Hwan, Park, Kwang Young, Oh, Dong Young
Published in Tetrahedron letters (14.05.1998)

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METHOD FOR PRODUCING RESIST PATTERN

by HAH JUNG-HWAN, HATA MITSUHIRO
Year of Publication 18.08.2011

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PROCESS FOR PRODUCING PHOTORESIST PATTERN

by HAH JUNG HWAN, HATA MITSUHIRO
Year of Publication 07.07.2011

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A Facile Synthesis of Diethyl 1-Formylalkane Phosphonates via Ozonolysis of 1-Alkyl Allylic Phosphonates

by Gil, Jun Mo, Hah, Jung Hwan, Park, Kwang Young, Oh, Dong Young
Published in Synthetic communications (01.03.2000)

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RESIST COMPOSITION

by ICHIKAWA KOJI, HAH JUNG-HWAN, HASHIMOTO KAZUHIKO
Year of Publication 23.06.2011

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PHOTORESIST COMPOSITION

by ICHIKAWA KOJI, HASHIMOTO KAZUHIKO, HAH JUNG HWAN
Year of Publication 12.05.2011

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RESIST COMPOSITION AND PATTERN FORMING METHOD

by ICHIKAWA KOJI, HAH JUNG-HWAN, MUKAI YUICHI
Year of Publication 28.04.2011

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ChemInform Abstract: Design, Synthesis and Antiviral Activity of 5-Hydroxymethyl-3-phosphonyl-4,5-dihydrofuran Analogues of Nucleotides

by Lee, Hee-Yoon, Lee, Kiho, Hah, Jung Hwan, Moon, Deuk Kyu, Lee, Chong-Kyo
Published in ChemInform (04.01.2011)

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Journal Article

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A New and Facile Synthetic Route to 1-Alkyl-2-Oxopropylphosphonates : 1-Alkylation with Subsequent Ozonolysis of 2-Methyl Allylic Phosphonates

by MoGil, Jun, YoungPark, Kwang, HwanHah, Jung, YoungOh, Dong
Published in Synthetic communications (01.10.1998)

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Journal Article

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Oligomer probe array with improved signal-to-noise ratio fabrication method thereof

by HAH JUNG-HWAN, CHI SUNG-MIN, KIM KYOUNG-SEON, KIM WON-SUN
Year of Publication 01.10.2013

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Patent

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Biochip kits and methods of testing biological samples using the same

by CHOI, SANG-JUN, KIM, KYOUNG-SEON, CHI, SUNG-MIN, HAH, JUNG-HWAN, KIM, WON-SUN
Year of Publication 22.05.2013

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OLIGOMER PROBE ARRAY WITH IMPROVED SIGNAL-TO-NOISE RATIO AND DETECTION SENSITIVITY AND METHOD OF MANUFACTURING THE SAME

by HAH JUNG-HWAN, CHI SUNG-MIN, KIM KYOUNG-SEON, KIM WON-SUN
Year of Publication 16.08.2012

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Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device

by HAH JUNG-HWAN, MITSUHIRO HATA, KIM HYUN-WOO, SUBRAMANYA KOLAKE MAYYA, HONG JIN, WOO SANG-GYUN
Year of Publication 14.08.2012

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Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device

by Hah, Jung-Hwan, Hong, Jin, Kim, Hyun-Woo, Mitsuhiro, Hata, Subramanya, Kolake Mayya, Woo, Sang-Gyun
Year of Publication 14.08.2012

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Process for producing photoresist pattern

by HAH, JUNG-HWAN, HATA, MITSUHIRO
Year of Publication 01.10.2011

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Process for producing photoresist pattern

by HAH JUNG HWAN, HATA MITSUHIRO
Year of Publication 13.07.2011

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Photolabile compound, oligomer probe array and substrate for oligomer probe array containing the same, and manufacturing method of the same

by Chi, Sung-min, Hah, Jung-hwan, Kim, Kyoung-seon, Kim, Won-sun, Ryoo, Man-hyoung
Year of Publication 11.10.2011

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Photolabile compound, oligomer probe array and substrate for oligomer probe array containing the same, and manufacturing method of the same

by HAH JUNG-HWAN, CHI SUNG-MIN, KIM KYOUNG-SEON, RYOO MAN-HYOUNG, KIM WON-SUN
Year of Publication 11.10.2011

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