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"HAAS EDWIN G"
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"HAAS EDWIN G"
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Two-axis sagittal focusing monochromator
by
ZHONG ZHONG
,
STELMACH CHRISTOPHER
,
HAAS EDWIN G
Year of Publication
13.05.2014
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Two-Axis Sagittal Focusing Monochromator
by
ZHONG ZHONG
,
STELMACH CHRISTOPHER
,
HAAS EDWIN G
Year of Publication
15.03.2012
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MATRIZ DE FORMA AJUSTABLE
by
KESSELMAN, MARTIN
,
HAAS
,
EDWIN
,
G
Year of Publication
16.12.2001
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ADJUSTABLE FORM DIE
by
KESSELMAN, MARTIN
,
HAAS
,
EDWIN
,
G
Year of Publication
10.10.2001
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Strain free temperature-compensated optical mounts
by
HAAS
;
EDWIN G
Year of Publication
04.06.1996
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ADJUSTABLE FORM DIE
by
KESSELMAN, MARTIN
,
HAAS
,
EDWIN
,
G
Year of Publication
15.04.1998
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ADJUSTABLE FORM DIE
by
KESSELMAN, MARTIN
,
HAAS
,
EDWIN
,
G
Year of Publication
24.09.1997
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Adjustable form die
by
HAAS
;
EDWIN G
,
KESSELMAN; MARTIN
Year of Publication
20.08.1996
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ADJUSTABLE FORM DIE
by
KESSELMAN, MARTIN
,
HAAS
,
EDWIN
,
G
Year of Publication
13.06.1996
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Interferometer mit Grob- und Feineinstellung
by
HILGEMAN, THEODORE W
,
RYAN, ROBERT E
,
HAAS
,
EDWIN G
Year of Publication
19.02.2004
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Interferometer of Fabry-Perot type with possible zero spacing
by
RYAN, ROBERT, E
,
HILGEMAN, THEODORE, W
,
HAAS
,
EDWIN
,
G
Year of Publication
30.07.2003
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System and method for providing a lithographic light source for a semiconductor manufacturing process
by
CALIA VINCENT S
,
HAAS EDWIN G
,
GUTOWSKI ROBERT M
Year of Publication
22.04.2003
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System and method for providing a lithographic light source for a semiconductor manufacturing process
by
Haas
,
Edwin G
,
Gutowski, Robert M
,
Calia, Vincent S
Year of Publication
22.04.2003
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Interferometer with coarse and fine displacement
by
HILGEMAN, THEODORE W
,
RYAN, ROBERT E
,
HAAS
,
EDWIN G
Year of Publication
16.04.2003
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Self-leveling mount or platform for a rapid deployment system
by
HAAS
;
EDWIN G
,
SULLIVAN; EDWARD V
Year of Publication
07.04.1998
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Fluid nozzle system and method in an emitted energy system for photolithography
by
Haas
,
Edwin G
,
Gutowski, Robert M
,
Calia, Vincent S
Year of Publication
20.08.2002
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Fluid nozzle system and method in an emitted energy system for photolithography
by
CALIA VINCENT S
,
HAAS EDWIN G
,
GUTOWSKI ROBERT M
Year of Publication
20.08.2002
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System and method for providing a lithographic light source for a semiconductor manufacturing process
by
CALIA VINCENT S
,
HAAS EDWIN G
,
GUTOWSKI ROBERT M
Year of Publication
02.05.2002
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Holder assembly system and method in an emitted energy system for photolithography
by
PEACOCK MICHAEL A
,
HAAS EDWIN G
,
GUTOWSKI ROBERT M
Year of Publication
05.03.2002
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Holder assembly system and method in an emitted energy system for photolithography
by
Haas
,
Edwin G
,
Peacock, Michael A
,
Gutowski, Robert M
Year of Publication
05.03.2002
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